CK

Chung-Chi Ko

TSMC: 117 patents #201 of 12,232Top 2%
📍 Nantou, TW: #1 of 154 inventorsTop 1%
Overall (All Time): #10,476 of 4,157,543Top 1%
117
Patents All Time

Issued Patents All Time

Showing 26–50 of 117 patents

Patent #TitleCo-InventorsDate
11329141 Spacer structure with high plasma resistance for semiconductor devices Wan-Yi Kao 2022-05-10
11328952 Interconnect structure and method Chia-Cheng Chou, Chih-Chien Chi, Yao-Jen Chang, Chen-Yuan Kao, Kai-Shiang Kuo +3 more 2022-05-10
11322412 Forming nitrogen-containing low-K gate spacer Wan-Yi Kao 2022-05-03
11295948 Low-K feature formation processes and structures formed thereby Wan-Yi Kao, Li Chun Te, Hsiang-Wei Lin, Te-En Cheng, Wei-Ken Lin +2 more 2022-04-05
11282749 Forming nitrogen-containing low-k gate spacer Wan-Yi Kao 2022-03-22
11282712 Method for preventing bottom layer wrinkling in a semiconductor device Jung-Hau Shiu, Tze-Liang Lee, Yu-Yun Peng 2022-03-22
11244823 Varying temperature anneal for film and structures formed thereby Shu Ling Liao, Wan-Yi Kao 2022-02-08
11211243 Method of filling gaps with carbon and nitrogen doped film Wan-Yi Kao 2021-12-28
11075123 Method for forming isolation structure having improved gap-fill capability Wan-Yi Kao, Wei LI 2021-07-27
11069812 Fin field-effect transistor device and method of forming the same Wan-Yi Kao 2021-07-20
11049763 Multi-patterning to form vias with straight profiles Chun-Kai Chen, Jung-Hau Shiu, Chia-Cheng Chou, Tze-Liang Lee, Chih-Hao Chen +1 more 2021-06-29
11024550 Semiconductor device and method Shu Ling Liao 2021-06-01
10971589 Low-k feature formation processes and structures formed thereby Wan-Yi Kao 2021-04-06
10957543 Device and method of dielectric layer Yu-Yun Peng, Keng-Chu Lin 2021-03-23
10950431 Low-k feature formation processes and structures formed thereby Wan-Yi Kao, Li Chun Te, Hsiang-Wei Lin, Te-En Cheng, Wei-Ken Lin +2 more 2021-03-16
10943820 Gap-fill method having improved gap-fill capability Wan-Yi Kao, Wei LI, Yu-Cheng Shiau, Han-Sheng Weng, Chih-Tang Peng +1 more 2021-03-09
10867860 Methods of forming FinFET device Wan-Yi Kao 2020-12-15
10840134 Interconnect structure and method Chia-Cheng Chou, Chih-Chien Chi, Yao-Jen Chang, Chen-Yuan Kao, Kai-Shiang Kuo +3 more 2020-11-17
10818598 Methods for reducing dual damascene distortion Chao-Chun Wang, Po-Cheng Shih 2020-10-27
10804374 Spacer structure with high plasma resistance for semiconductor devices Wan-Yi Kao 2020-10-13
10748760 Varying temperature anneal for film and structures formed thereby Shu Ling Liao, Wan-Yi Kao 2020-08-18
10692773 Forming nitrogen-containing low-K gate spacer Wan-Yi Kao 2020-06-23
10516035 Semiconductor device structure with a low-k spacer layer and method for manufacturing the same Hsiang-Wei Lin 2019-12-24
10516036 Spacer structure with high plasma resistance for semiconductor devices Wan-Yi Kao 2019-12-24
10515822 Method for preventing bottom layer wrinkling in a semiconductor device Jung-Hau Shiu, Tze-Liang Lee, Yu-Yun Peng 2019-12-24