KT

Kazushige Takaishi

SU Sumco: 20 patents #10 of 464Top 3%
MM Mitsubishi Materials: 2 patents #498 of 1,543Top 35%
MS Mitsubishi Materials Silicon: 2 patents #21 of 116Top 20%
SS Sumitomo Mitsubishi Silicon: 2 patents #32 of 146Top 25%
Overall (All Time): #158,951 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
12311496 Method of double-side polishing work, method of producing work, and double-side polishing apparatus for a work Chin-Fu Tsai 2025-05-27
9190267 Epitaxial silicon wafer and production method thereof Takayuki Kihara, Yasuyuki Hashimoto 2015-11-17
8900033 Wafer polishing method Keiichi Takanashi, Tetsurou Taniguchi, Shinichi Ogata, Shunsuke Mikuriya 2014-12-02
8759229 Method for manufacturing epitaxial wafer Sakae Koyata, Tomohiro Hashii, Katsuhiko Murayama, Takeo Katoh 2014-06-24
8728942 Method for producing epitaxial silicon wafer Shinichi Ogata, Hironori Nishimura, Shigeru Okuuchi, Shunsuke Mikuriya, Yuichi Nakayoshi 2014-05-20
8466071 Method for etching single wafer Sakae Koyata, Tomohiro Hashii, Katsuhiko Murayama, Takeo Katoh 2013-06-18
8147295 Method of polishing silicon wafer Takeo Katoh, Ryuichi Tanimoto, Shinichi Ogata, Takeru Takushima 2012-04-03
8080106 Epitaxial silicon wafer and production method thereof Takayuki Kihara, Yasuyuki Hashimoto 2011-12-20
8066896 Apparatus for etching wafer by single-wafer process and single wafer type method for etching wafer Sakae Koyata, Tomohiro Hashii, Katsuhiko Murayama, Takeo Katoh 2011-11-29
7998867 Method for manufacturing epitaxial wafer Tomonori Miura 2011-08-16
7955440 Method for cleaning silicon wafer and apparatus for cleaning the silicon wafer Shigeru Okuuchi 2011-06-07
7955982 Method for smoothing wafer surface and apparatus used therefor Takeo Katoh, Tomohiro Hashii, Katsuhiko Murayama, Sakae Koyata 2011-06-07
7906438 Single wafer etching method Sakae Koyata, Tomohiro Hashii, Katsuhiko Murayama, Takeo Katoh 2011-03-15
7851375 Alkaline etchant for controlling surface roughness of semiconductor wafer Sakae Koyata 2010-12-14
7717768 Wafer polishing apparatus and method for polishing wafers Tomohiro Hashii, Katsuhiko Murayama, Sakae Koyata 2010-05-18
7648890 Process for producing silicon wafer Sakae Koyata, Tomohiro Hashii, Katsuhiko Murayama, Takeo Katoh 2010-01-19
7645702 Manufacturing method of silicon wafer Sakae Koyata 2010-01-12
7601644 Method for manufacturing silicon wafers Sakae Koyata, Tomohiro Hashii, Katsuhiko Murayama, Takeo Katoh 2009-10-13
7601642 Method of processing silicon wafer Sakae Koyata 2009-10-13
7488400 Apparatus for etching wafer by single-wafer process Sakae Koyata, Tomohiro Hashii, Katsuhiko Murayama, Takeo Katoh 2009-02-10
7456106 Method for producing a silicon wafer Sakae Koyata, Tohru Taniguchi, Kazuo Fujimaki 2008-11-25
7338904 Method for manufacturing single-side mirror surface wafer Sakae Koyata, Tadashi Denda, Masashi Norimoto 2008-03-04
7226864 Method for producing a silicon wafer Sakae Koyata, Tohru Taniguchi, Kazuo Fujimaki, Akihiro Kudo, Masashi Norimoto 2007-06-05
6296714 Washing solution of semiconductor substrate and washing method using the same Chizuko Matsuo, Mikio Kishimoto 2001-10-02
6146467 Treatment method for semiconductor substrates Ryoko Takada 2000-11-14