SK

Shingo Kadomura

SO Sony: 49 patents #491 of 25,231Top 2%
GT Gamma Precision Technology: 1 patents #3 of 4Top 75%
TU Tohoku University: 1 patents #615 of 1,680Top 40%
Overall (All Time): #52,981 of 4,157,543Top 2%
51
Patents All Time

Issued Patents All Time

Showing 1–25 of 51 patents

Patent #TitleCo-InventorsDate
8828886 Low dielectric constant insulating film and method for forming the same Seiji Samukawa, Shigeo Yasuhara, Tsutomu Shimayama, Hisashi Yano, Kunitoshi Tajima +2 more 2014-09-09
6943104 Method of etching insulating film and method of forming interconnection layer Masanaga Fukasawa 2005-09-13
6805973 Aluminum nitride/aluminum base composite material and a method for producing thereof Kei Takatsu, Shinsuke Hirano, Nobuyuki Suzuki 2004-10-19
6668905 Aluminum nitride/aluminum base composite material and method of producing the same Kei Takatsu, Shinsuke Hirano, Nobuyuki Suzuki 2003-12-30
6645852 Process for fabricating a semiconductor device having recess portion Mitsuru Taguchi, Miyata Koji 2003-11-11
6638848 Method of etching insulating film and method of forming interconnection layer Masanaga Fukasawa 2003-10-28
6391437 COMPOSITE MATERIAL AND MANUFACTURING METHOD THEREOF, SUBSTRATE PROCESSING APPARATUS AND MANUFACTURING METHOD THEREOF, SUBSTRATE MOUNTING STAGE AND MANUFACTURING METHOD THEREOF, AND SUBSTRATE PROCESSING METHOD Kei Takatsu, Shinsuke Hirano 2002-05-21
6380065 Interconnection structure and fabrication process therefor Naoki Komai, Mitsuru Taguchi, Akira Yoshio, Takaaki Miyamoto 2002-04-30
6352937 Method for stripping organic based film Jerry Wong, Masato Toshima 2002-03-05
6191031 Process for producing multi-layer wiring structure Mitsuru Taguchi 2001-02-20
6174408 Method and apparatus for dry etching Tomohide Jozaki, Shinsuke Hirano 2001-01-16
6120661 Apparatus for processing glass substrate Shinsuke Hirano, Kei Takatsu 2000-09-19
6096160 Helicon wave plasma processing apparatus 2000-08-01
6063710 Method and apparatus for dry etching with temperature control Tomohide Jozaki, Shinsuke Hirano 2000-05-16
5994226 Dry etching method 1999-11-30
5981913 Static electricity chuck and wafer stage Tomohide Jozaki, Shinsuke Hirano, Kinya Miyashita, Seiichirou Miyata, Yoshiaki Tatsumi 1999-11-09
5968273 Wafer stage for manufacturing a semiconductor device Tomohide Jozaki, Shinsuke Hirano, Kinya Miyashita, Yoshiaki Tatsumi, Seiichirou Miyata 1999-10-19
5962084 Plasma CVD process and semiconductor device having metal film formed by the process Takaaki Miyamoto, Atsushi Kawashima 1999-10-05
5738752 System and method for plasma etching 1998-04-14
5662819 Plasma processing method with controlled ion/radical ratio 1997-09-02
5599742 Interconnection forming method 1997-02-04
5567268 Plasma processing apparatus and method for carrying out plasma processing by using such plasma processing apparatus 1996-10-22
5540812 Dry etching method 1996-07-30
5429710 Dry etching method Hari Akiba 1995-07-04
5401358 Dry etching method 1995-03-28