Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8078996 | Method and system for correcting a mask pattern design | Shigeki Nojima, Toshiya Kotani, Satoshi Tanaka | 2011-12-13 |
| 8028267 | Pattern designing method, pattern designing program and pattern designing apparatus | — | 2011-09-27 |
| 7925090 | Method of determining photo mask, method of manufacturing semiconductor device, and computer program product | Toshiya Kotani, Kazuya Fukuhara | 2011-04-12 |
| 7851236 | Film thickness prediction method, layout design method, mask pattern design method of exposure mask, and fabrication method of semiconductor integrated circuit | Keiichi Maeda, Naoki Komai | 2010-12-14 |
| 7788626 | Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method | Shigeki Nojima, Satoshi Tanaka, Toshiya Kotani, Soichi Inoue | 2010-08-31 |
| 7784020 | Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device | Fumihiro Minami, Toshiaki Ueda, Ryuji Ogawa, Satoshi Tanaka | 2010-08-24 |
| 7631287 | Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method | Toshiya Kotani, Satoshi Tanaka | 2009-12-08 |
| 7571417 | Method and system for correcting a mask pattern design | Shigeki Nojima, Toshiya Kotani, Satoshi Tanaka | 2009-08-04 |
| 7541136 | Mask, manufacturing method for mask, and manufacturing method for semiconductor device | Hideki Kanai, Soichi Inoue, Shingo Kanamitsu, Shinichi Ito | 2009-06-02 |
| 7371483 | Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device | Shingo Kanamitsu, Takashi Hirano, Soichi Inoue, Shinichi Ito | 2008-05-13 |
| 7250235 | Focus monitor method and mask | Masafumi Asano, Tadahito Fujisawa | 2007-07-31 |
| 7200833 | Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method | Toshiya Kotani, Satoshi Tanaka | 2007-04-03 |
| 7194704 | Design layout preparing method | Toshiya Kotani, Shigeki Nojima, Suigen Kyoh, Ryuji Ogawa, Satoshi Tanaka +2 more | 2007-03-20 |
| 7108945 | Photomask having a focus monitor pattern | Takumichi Sutani, Tadahito Fujisawa, Soichi Inoue | 2006-09-19 |
| 7094504 | Mask, manufacturing method for mask, and manufacturing method for semiconductor device | Hideki Kanai, Soichi Inoue, Shingo Kanamitsu, Shinichi Ito | 2006-08-22 |
| 6741334 | Exposure method, exposure system and recording medium | Masafumi Asano, Tadahito Fujisawa | 2004-05-25 |
| 6667139 | Method of manufacturing semiconductor device | Tadahito Fujisawa, Masafumi Asano | 2003-12-23 |
| 6440616 | Mask and method for focus monitoring | Tadahito Fujisawa, Soichi Inoue | 2002-08-27 |