Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8551246 | Method for evaluating oxide dielectric breakdown voltage of a silicon single crystal wafer | Fumio Tahara, Tsuyoshi Ohtsuki, Kiyoshi Mitani | 2013-10-08 |
| 7659216 | Method for producing annealed wafer and annealed wafer | — | 2010-02-09 |
| 7622312 | Method for evaluating dopant contamination of semiconductor wafer | — | 2009-11-24 |
| 7189293 | Method of producing annealed wafer and annealed wafer | Norihiro Kobayashi, Masaro Tamatsuka, Wei Qu, Hiroshi Takeno, Ken Aihara | 2007-03-13 |
| 7153785 | Method of producing annealed wafer and annealed wafer | Norihiro Kobayashi, Masaro Tamatsuka, Wei Qu | 2006-12-26 |
| 6841450 | Annealed wafer manufacturing method and annealed wafer | Norihiro Kobayashi, Masaro Tamatsuka, Wei Qu, Makoto Iida | 2005-01-11 |
| 6805743 | Method for manufacturing single-crystal-silicon wafers | Norihiro Kobayashi, Masaro Tamatsuka | 2004-10-19 |
| 6670261 | Production method for annealed wafer | Shoji Akiyama, Norihiro Kobayashi, Masaro Tamatsuka | 2003-12-30 |
| 5685905 | Method of manufacturing a single crystal thin film | Hisashi Kashino, Hitoshi Habuka | 1997-11-11 |
| 5487358 | Apparatus for growing silicon epitaxial layer | Yutaka Ohta | 1996-01-30 |
| 5421288 | Process for growing silicon epitaxial layer | Yutaka Ohta | 1995-06-06 |
| 5172188 | Pattern shift measuring method | — | 1992-12-15 |
| 5156982 | Pattern shift measuring method | — | 1992-10-20 |