| 7462269 |
Method for low temperature annealing of metallization micro-structures in the production of a microelectronic device |
Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham |
2008-12-09 |
| 7429537 |
Methods and apparatus for rinsing and drying |
Brian Aegerter, Tom Ritzdorf, Gary L. Curtis, Michael Jolley |
2008-09-30 |
| 7399713 |
Selective treatment of microelectric workpiece surfaces |
Brian Aegerter, Tom Ritzdorf, Gary L. Curtis, Michael Jolley, Steven L. Peace |
2008-07-15 |
| 7102763 |
Methods and apparatus for processing microelectronic workpieces using metrology |
Thomas Ritzdorf, Steve Eudy, Gregory J. Wilson, Paul R. McHugh, Robert A. Weaver +2 more |
2006-09-05 |
| 7001471 |
Method and apparatus for low-temperature annealing of metallization microstructures in the production of a microelectronic device |
Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham |
2006-02-21 |
| 6994776 |
Method and apparatus for low temperature annealing of metallization micro-structure in the production of a microelectronic device |
Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham |
2006-02-07 |
| 6794291 |
Reactor for processing a semiconductor wafer |
Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter |
2004-09-21 |
| 6692613 |
Reactor for processing a semiconductor wafer |
Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter |
2004-02-17 |
| 6632292 |
Selective treatment of microelectronic workpiece surfaces |
Brian Aegerter, Tom Ritzdorf, Gary L. Curtis, Michael Jolley |
2003-10-14 |
| 6508920 |
Apparatus for low-temperature annealing of metallization microstructures in the production of a microelectronic device |
Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham |
2003-01-21 |
| 6447633 |
Reactor for processing a semiconductor wafer |
Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter |
2002-09-10 |
| 6423642 |
Reactor for processing a semiconductor wafer |
Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter |
2002-07-23 |
| 6413436 |
Selective treatment of the surface of a microelectronic workpiece |
Brian Aegerter, Michael Jolley, Tom Ritzdorf, Steven L. Peace, Gary L. Curtis +1 more |
2002-07-02 |