Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7462269 | Method for low temperature annealing of metallization micro-structures in the production of a microelectronic device | Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham | 2008-12-09 |
| 7429537 | Methods and apparatus for rinsing and drying | Brian Aegerter, Tom Ritzdorf, Gary L. Curtis, Michael Jolley | 2008-09-30 |
| 7399713 | Selective treatment of microelectric workpiece surfaces | Brian Aegerter, Tom Ritzdorf, Gary L. Curtis, Michael Jolley, Steven L. Peace | 2008-07-15 |
| 7102763 | Methods and apparatus for processing microelectronic workpieces using metrology | Thomas Ritzdorf, Steve Eudy, Gregory J. Wilson, Paul R. McHugh, Robert A. Weaver +2 more | 2006-09-05 |
| 7001471 | Method and apparatus for low-temperature annealing of metallization microstructures in the production of a microelectronic device | Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham | 2006-02-21 |
| 6994776 | Method and apparatus for low temperature annealing of metallization micro-structure in the production of a microelectronic device | Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham | 2006-02-07 |
| 6794291 | Reactor for processing a semiconductor wafer | Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter | 2004-09-21 |
| 6692613 | Reactor for processing a semiconductor wafer | Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter | 2004-02-17 |
| 6632292 | Selective treatment of microelectronic workpiece surfaces | Brian Aegerter, Tom Ritzdorf, Gary L. Curtis, Michael Jolley | 2003-10-14 |
| 6508920 | Apparatus for low-temperature annealing of metallization microstructures in the production of a microelectronic device | Thomas Ritzdorf, E. Henry Stevens, Linlin Chen, Lyndon Graham | 2003-01-21 |
| 6447633 | Reactor for processing a semiconductor wafer | Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter | 2002-09-10 |
| 6423642 | Reactor for processing a semiconductor wafer | Steven L. Peace, Gary L. Curtis, Raymon F. Thompson, Brian Aegerter | 2002-07-23 |
| 6413436 | Selective treatment of the surface of a microelectronic workpiece | Brian Aegerter, Michael Jolley, Tom Ritzdorf, Steven L. Peace, Gary L. Curtis +1 more | 2002-07-02 |