SC

Sang-jun Choi

Samsung: 109 patents #368 of 75,807Top 1%
Applied Materials: 5 patents #2,165 of 7,310Top 30%
CI Cheil Industries: 2 patents #451 of 975Top 50%
LC Lg-Nortel Co.: 2 patents #1 of 76Top 2%
UN Unknown: 2 patents #12,644 of 83,584Top 20%
LC Lg Information & Communications: 1 patents #42 of 194Top 25%
LG: 1 patents #17,402 of 26,165Top 70%
HE Hynix (Hyundai Electronics): 1 patents #731 of 1,604Top 50%
HM Hyundai Motor: 1 patents #6,384 of 11,886Top 55%
KM Kia Motors: 1 patents #3,666 of 7,429Top 50%
📍 Seoul, CA: #42 of 604 inventorsTop 7%
Overall (All Time): #7,771 of 4,157,543Top 1%
135
Patents All Time

Issued Patents All Time

Showing 76–100 of 135 patents

Patent #TitleCo-InventorsDate
7054320 Apparatus and method for processing AAL2 which supports multiple virtual channels in mobile communication system Byung Cheon Lee 2006-05-30
7045267 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee +1 more 2006-05-16
7018892 Semiconductor capacitor structure and method for manufacturing the same Woo-Gwan Shim, Chang-Ki Hong, Jeong-Nam Han 2006-03-28
6966952 Apparatus of depositing thin film with high uniformity Young-eal Kim, Dong-joon Ma 2005-11-22
6964839 Photosensitive polymer having cyclic backbone and resist composition containing the same Hyun-Woo Kim, Sang-Gyun Woo, Joo-tae Moon 2005-11-15
6897005 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same Hyun-Woo Kim 2005-05-24
6893793 Photosensitive polymer and chemically amplified photoresist composition containing the same Dong-won Jung, Si-hyeung Lee, Sook Lee 2005-05-17
6849382 Photosensitive polymer containing silicon and a resist composition using the same 2005-02-01
6844134 Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same Joo-tae Moon, Sang-Gyun Woo, Kwang-Sub Yoon, Ki Yong Song 2005-01-18
6836214 Burglar alarm 2004-12-28
6835529 Polymer having butadiene sulfone repeating unit and resist composition comprising the same Woo-Sung Han, Sang-Gyun Woo 2004-12-28
6833230 Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same 2004-12-21
6803176 Methods for forming line patterns in semiconductor substrates Yool Kang, Joo-tae Moon, Jeong-hee Chung, Sang-Gyun Woo 2004-10-12
6800418 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same Kwang-Sub Yoon, Ki Yong Song, Sang-Gyun Woo 2004-10-05
6794859 Automatic multimeter 2004-09-21
6791462 Sleepy alarm system activated by heart pulse meter 2004-09-14
6777162 Photosensitive polymer and photoresist composition thereof 2004-08-17
6772049 Centralized automatic energy control system 2004-08-03
6753125 Photosensitive polymer having fused aromatic ring and photoresist composition containing the same Yool Kang 2004-06-22
6713229 Terpolymer for amplified resist Chun-geun Park, Young-bum Koh 2004-03-30
6673513 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same Hyun-Woo Kim 2004-01-06
6642336 Photosensitive polymer Sook Lee, Ki Young Kwon, Si-hyeung Lee, Kwang-Sub Yoon, Hyun-Woo Kim +2 more 2003-11-04
6596459 Photosensitive polymer and resist composition containing the same Hyun-Woo Kim, Ki Young Kwon, Si-hyeung Lee, Dong-won Jung, Sook Lee +2 more 2003-07-22
6593441 Photosensitive polymer and chemically amplified photoresist composition containing the same Dong-won Jung, Si-hyeung Lee, Sook Lee 2003-07-15
6537727 Resist composition comprising photosensitive polymer having loctone in its backbone Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee +1 more 2003-03-25