Issued Patents All Time
Showing 101–125 of 135 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6517990 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | Hyun-Woo Kim | 2003-02-11 |
| 6515038 | Resist compositions containing polymers having dialkyl malonate groups for use in chemically amplified resists | — | 2003-02-04 |
| 6503687 | Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition | Hyun-Woo Kim, Si-hyueng Lee, Ki Young Kwon, Dong-won Jung, Sang-Gyun Woo | 2003-01-07 |
| 6485895 | Methods for forming line patterns in semiconductor substrates | Yool Kang, Joo-tae Moon, Jeong-hee Chung, Sang-Gyun Woo | 2002-11-26 |
| 6472120 | Photosensitive polymer and chemically amplified photoresist composition containing the same | Dong-won Jung, Si-hyeung Lee, Sook Lee | 2002-10-29 |
| 6452495 | Security barbed wire | — | 2002-09-17 |
| 6416927 | Chemically amplified resist compositions | Chun-geun Park, Young-bum Koh | 2002-07-09 |
| 6300036 | Photosensitive polymers and chemically amplified photoresist compositions using the same | Yool Kang, Dong-won Jung, Chun-geun Park | 2001-10-09 |
| 6294630 | Polymers having dialkyl malonate groups and resist compositions containing the same for use in chemically amplified resists | — | 2001-09-25 |
| 6287747 | Photosensitive polymer having cyclic backbone and resist composition comprising the same | Dong-won Jung, Si-hyeung Lee | 2001-09-11 |
| 6284438 | Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the same | Yool Kang, Si-hyeung Lee, Joo-tae Moon | 2001-09-04 |
| 6280903 | Chemically amplified resist composition | Yool Kang, Dong-won Jung, Chun-geun Park, Young-bum Koh | 2001-08-28 |
| 6277538 | Photosensitive polymer having cyclic backbone and resist composition comprising the same | Dong-won Jung | 2001-08-21 |
| 6271113 | Method for forming wiring in semiconductor device | Tak Hyun Yoon, Wouns Yang | 2001-08-07 |
| 6270942 | Photosensitive polymer having cyclic backbone and resist composition comprising the same | — | 2001-08-07 |
| 6245482 | Polymer and chemically amplified resist composition including silicon containing protecting group | Joo-tae Moon | 2001-06-12 |
| 6171754 | Chemically amplified resist compositions | Chun-geun Park, Young-bum Koh | 2001-01-09 |
| 6165680 | Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same | — | 2000-12-26 |
| 6143466 | Chemically amplified photoresist composition | — | 2000-11-07 |
| 6143465 | Photosensitive polymer having cyclic backbone and resist composition comprising same | — | 2000-11-07 |
| 6114084 | Chemically amplified resist composition | Yool Kang, Dong-won Jung, Chun-geun Park, Young-bum Koh | 2000-09-05 |
| 6114422 | Resist composition containing dialkyl malonate in base polymer | — | 2000-09-05 |
| 6103450 | Photosensitive polymer, dissolution inhibitor and chemically amplified photoresist composition containing the same | — | 2000-08-15 |
| 6103845 | Chemically amplified resist polymers | Chun-geun Park, Young-bum Koh | 2000-08-15 |
| 6083659 | Polymer mixture for photoresist and photoresist composition containing the same | — | 2000-07-04 |