SW

Sang-Gyun Woo

Samsung: 61 patents #1,274 of 75,807Top 2%
Overall (All Time): #38,234 of 4,157,543Top 1%
61
Patents All Time

Issued Patents All Time

Showing 26–50 of 61 patents

Patent #TitleCo-InventorsDate
7575855 Method of forming pattern Cha-Won Koh, Gi-Sung Yeo, Myoung-Ho Jung 2009-08-18
7560768 Nonvolatile memory device and method of manufacturing the same Cha-Won Koh, Byung-Hong Chung, Jeong-Lim Nam, Seok-Hwan Oh, Jai-Hyuk Song +2 more 2009-07-14
7550383 Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same Joon-soo Park, Gi-Sung Yeo, Han-ku Cho, Tae-Young Kim, Byeong-Soo Kim 2009-06-23
7547936 Semiconductor memory devices including offset active regions Doo-Hoon Goo, Han-ku Cho, Joo-tae Moon, Gi-Sung Yeo, Kyoung-Yun Baek 2009-06-16
7540970 Methods of fabricating a semiconductor device Cha-Won Koh, Jeong-Lim Nam, Kyeong-Koo Chi, Seok-Hwan Oh, Gi-Sung Yeo +2 more 2009-06-02
7473647 Method of forming pattern using fine pitch hard mask Ji-Young Lee, Joon-soo Park 2009-01-06
7403276 Photomask for measuring lens aberration, method of its manufacture, and method of its use Jang-Ho Shin, Han-ku Cho, Suk-Joo Lee 2008-07-22
7387869 Method of forming pattern for semiconductor device Cha-Won Koh, Byeong-Soo Kim 2008-06-17
7384730 Top coating composition for photoresist and method of forming photoresist pattern using same Mitsuhiro Hata, Man-Hyoung Ryoo, Hyun-Woo Kim, Jin Young Yoon, Jung-hwan Hah 2008-06-10
7361609 Mask patterns for semiconductor device fabrication and related methods Jung-hwan Hah, Hyun-Woo Kim, Mitsuhiro Hata 2008-04-22
7335455 Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same Hyun-Woo Kim, Jin Hong, Myoung-Ho Jung 2008-02-26
7314702 Composition for a bottom-layer resist Sung Ho Lee, Jin-Gi Hong 2008-01-01
7314691 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device Mitsuhiro Hata, Jung-hwan Hah, Hyun-Woo Kim 2008-01-01
7297466 Method of forming a photoresist pattern and method for patterning a layer using a photoresist Sung Ho Lee, Yun-sook Chae, Ji Soo Kim 2007-11-20
7259065 Method of forming trench in semiconductor device Doo-Hoon Goo, Si-hyeung Lee, Han-ku Cho, Gi-Sung Yeo 2007-08-21
7241552 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee +1 more 2007-07-10
7221014 DRAM devices having an increased density layout Doo-Hoon Goo, Jung-hyeon Lee, Gi-Sung Yeo, Han-ku Cho 2007-05-22
7202011 Photosensitive polymer including fluorine and resist composition containing the same Kwang-Sub Yoon, Ki Yong Song, Sang-jun Choi 2007-04-10
7045267 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee +1 more 2006-05-16
6964839 Photosensitive polymer having cyclic backbone and resist composition containing the same Sang-jun Choi, Hyun-Woo Kim, Joo-tae Moon 2005-11-15
6962768 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same Hyun-Woo Kim 2005-11-08
6844134 Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same Sang-jun Choi, Joo-tae Moon, Kwang-Sub Yoon, Ki Yong Song 2005-01-18
6835529 Polymer having butadiene sulfone repeating unit and resist composition comprising the same Sang-jun Choi, Woo-Sung Han 2004-12-28
6803176 Methods for forming line patterns in semiconductor substrates Sang-jun Choi, Yool Kang, Joo-tae Moon, Jeong-hee Chung 2004-10-12
6800418 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same Kwang-Sub Yoon, Ki Yong Song, Sang-jun Choi 2004-10-05