Issued Patents All Time
Showing 51–61 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6787287 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | Hyun-Woo Kim, Yool Kang | 2004-09-07 |
| 6713228 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | Hyun-Woo Kim, Sung Ho Lee | 2004-03-30 |
| 6696217 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | Kwang-Sub Yoon | 2004-02-24 |
| 6677100 | Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same | Hyun-Woo Kim | 2004-01-13 |
| 6642336 | Photosensitive polymer | Sook Lee, Ki Young Kwon, Si-hyeung Lee, Kwang-Sub Yoon, Hyun-Woo Kim +2 more | 2003-11-04 |
| 6596459 | Photosensitive polymer and resist composition containing the same | Hyun-Woo Kim, Ki Young Kwon, Si-hyeung Lee, Dong-won Jung, Sook Lee +2 more | 2003-07-22 |
| 6537727 | Resist composition comprising photosensitive polymer having loctone in its backbone | Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee +1 more | 2003-03-25 |
| 6503687 | Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition | Hyun-Woo Kim, Si-hyueng Lee, Ki Young Kwon, Dong-won Jung, Sang-jun Choi | 2003-01-07 |
| 6497987 | Photosensitive lithocholate derivative and chemically amplified photoresist composition containing the same | Hyun-Woo Kim, Sook Lee | 2002-12-24 |
| 6485895 | Methods for forming line patterns in semiconductor substrates | Sang-jun Choi, Yool Kang, Joo-tae Moon, Jeong-hee Chung | 2002-11-26 |
| 5851706 | Phase shift masks including chromium oxide and alumina phase shifter patterns, and methods of manufacturing and using the same | Sung Chul Lim, Ho-young Kang, Kwang-soo No | 1998-12-22 |