Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9563126 | Hardmask | Deyan Wang, Sabrina Wong, Cong Liu, Cheng-Bai Xu | 2017-02-07 |
| 9540476 | Aromatic resins for underlayers | Li Cui, Sung Wook Cho, Mingqi Li, Peter Trefonas, III, Robert L. Auger | 2017-01-10 |
| 9507259 | Photoresist composition | Mingqi Li, Emad Aqad, Cong Liu, Ching-Lung Chen, Cheng-Bai Xu +1 more | 2016-11-29 |
| 9448486 | Photoresist pattern trimming compositions and methods | Cong Liu, Seung Hyun Lee, Kevin Rowell, Gerhard Pohlers, Cheng-Bai Xu +2 more | 2016-09-20 |
| 9442377 | Wet-strippable silicon-containing antireflectant | Owendi Ongayi, Charlotte Cutler, Mingqi Li, James F. Cameron | 2016-09-13 |
| 9436082 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Cong Liu, Mingqi Li, Joon Seok Oh, Chunyi Wu +2 more | 2016-09-06 |
| 9334357 | Aromatic resins for underlayers | Seon-Hwa Han, Sung Wook Cho, Hae-Kwang Pyun, Jung-June Lee | 2016-05-10 |
| 9296879 | Hardmask | Deyan Wang, Sabrina Wong, Cong Liu, Cheng-Bai Xu | 2016-03-29 |
| 9156785 | Base reactive photoacid generators and photoresists comprising same | Emad Aqad, Mingqi Li, Cheng-Bai Xu, Deyan Wang, Cong Liu +1 more | 2015-10-13 |
| 9146470 | Photoacid generator and photoresist comprising same | Emad Aqad, Cheng-Bai Xu, Mingqi Li, William Williams, III | 2015-09-29 |
| 9136123 | Hardmask surface treatment | Deyan Wang, Peter Trefonas, III, Kathleen M. O'Connell | 2015-09-15 |
| 9029065 | Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article | Emad Aqad, Cheng-Bai Xu, Cong Liu, Mingqi Li | 2015-05-12 |
| 8900794 | Photoacid generator and photoresist comprising same | Emad Aqad, Cheng-Bai Xu, Mingqi Li, William Williams, III | 2014-12-02 |
| 7132214 | Polymers and photoresist compositions for short wavelength imaging | Gary N. Taylor, Robert L. Brainard | 2006-11-07 |
| 6399273 | Water-processable photoresist compositions | Timo Rager, C. Grant Willson | 2002-06-04 |