Issued Patents All Time
Showing 101–119 of 119 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6319797 | Process for manufacturing a semiconductor device | — | 2001-11-20 |
| 6319844 | Method of manufacturing semiconductor device with via holes reaching interconnect layers having different top-surface widths | Hidenobu Miyamoto | 2001-11-20 |
| 6294833 | Semiconductor device and fabrication process thereof | — | 2001-09-25 |
| 6255732 | Semiconductor device and process for producing the same | Takashi Yokoyama | 2001-07-03 |
| 6225217 | Method of manufacturing semiconductor device having multilayer wiring | Hidemitsu Aoki, Yasuaki Tsuchiya, Shinya Yamasaki | 2001-05-01 |
| 6222269 | Semiconductor device and fabrication process thereof | — | 2001-04-24 |
| 6194775 | Semiconductor element with thermally nitrided film on high resistance film and method of manufacturing the same | — | 2001-02-27 |
| 6187662 | Semiconductor device with low permittivity interlayer insulating film and method of manufacturing the same | Noriaki Oda | 2001-02-13 |
| 6157083 | Fluorine doping concentrations in a multi-structure semiconductor device | Hiraku Ishikawa | 2000-12-05 |
| 6140225 | Method of manufacturing semiconductor device having multilayer wiring | Hidemitsu Aoki, Yasuaki Tsuchiya, Shinya Yamasaki | 2000-10-31 |
| 6133137 | Semiconductor device and method of manufacturing the same | — | 2000-10-17 |
| 6124213 | Process of fabricating semiconductor device having ashing step for photo-resist mask in plasma produced from N.sub.x H.sub.y gas | Kouichi Ohto, Yasuhiko Ueda | 2000-09-26 |
| 6099747 | Chamber etching of plasma processing apparatus | — | 2000-08-08 |
| 6077574 | Plasma CVD process for forming a fluorine-doped SiO.sub.2 dielectric film | — | 2000-06-20 |
| 6005291 | Semiconductor device and process for production thereof | Kenichi Koyanagi, Kunihiro Fujii, Koji Kishimoto | 1999-12-21 |
| 5939771 | Semiconductor device having an organic resin layer and silicon oxide layer containing fluorine for preventing crosstalk between metal lines and a method of manufacturing the same | Tetsuya Homma | 1999-08-17 |
| 5863339 | Chamber etching of plasma processing apparatus | — | 1999-01-26 |
| 5751050 | Semiconductor device having a polysilicon resistor element with increased stability and method of fabricating same | Hiraku Ishikawa | 1998-05-12 |
| 5503678 | Vertical low pressure CVD apparatus with an adjustable nozzle | — | 1996-04-02 |