Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7420279 | Carbon containing silicon oxide film having high ashing tolerance and adhesion | Sadayuki Ohnishi, Tatsuya Usami, Noboru Morita, Kouji Arita, Ryouhei Kitao +1 more | 2008-09-02 |
| 7102236 | Carbon containing silicon oxide film having high ashing tolerance and adhesion | Sadayuki Ohnishi, Tatsuya Usami, Noboru Morita, Kouji Arita, Ryouhei Kitao +1 more | 2006-09-05 |
| 6124213 | Process of fabricating semiconductor device having ashing step for photo-resist mask in plasma produced from N.sub.x H.sub.y gas | Tatsuya Usami, Yasuhiko Ueda | 2000-09-26 |