HA

Hidemitsu Aoki

NE Nec: 35 patents #179 of 14,502Top 2%
NE Nec Electronics: 32 patents #5 of 1,789Top 1%
KK Kanto Kagaku: 8 patents #7 of 181Top 4%
RE Renesas Electronics: 4 patents #1,016 of 4,529Top 25%
OR Organo: 2 patents #52 of 167Top 35%
SC Sumitomo Chemical: 2 patents #1,792 of 4,033Top 45%
KC Kanto Chemical Co.: 1 patents #15 of 30Top 50%
Overall (All Time): #29,540 of 4,157,543Top 1%
70
Patents All Time

Issued Patents All Time

Showing 25 most recent of 70 patents

Patent #TitleCo-InventorsDate
8420549 Etching and cleaning methods and etching and cleaning apparatuses used therefor Shinya Yamasaki 2013-04-16
8129287 Method for manufacturing semiconductor device and semiconductor device Tatsuya Suzuki 2012-03-06
7943516 Manufacturing method for semiconductor device Tatsuya Suzuki, Takuo Ohwada, Kaoru Ikegami, Norio Ishikawa 2011-05-17
7862658 Etching and cleaning methods and etching and cleaning apparatuses used therefor Shinya Yamasaki 2011-01-04
7718532 Method of forming a high-k film on a semiconductor device Hiroaki Tomimori, Toshiyuki Iwamoto 2010-05-18
7687918 Semiconductor device and method for manufacturing same Yorinobu Kunimune, Mieko Hasegawa, Takamasa Itou, Takeshi Takeda 2010-03-30
7592266 Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Hiroaki Tomimori 2009-09-22
7560372 Process for making a semiconductor device having a roughened surface Hiroaki Tomimori, Kaoru Mikagi, Akira Furuya, Tetsuya Tao 2009-07-14
7442652 Method for removing contamination and method for fabricating semiconductor device Kaori Watanabe 2008-10-28
7402530 Method for manufacturing semiconductor device and semiconductor device Tatsuya Suzuki 2008-07-22
7368064 Cleaning solution and manufacturing method for semiconductor device Tatsuya Suzuki, Takuo Ohwada, Kaoru Ikegami, Norio Ishikawa 2008-05-06
7351354 Tungsten metal removing solution and method for removing tungsten metal by use thereof Toshikazu Shimizu, Kaori Watanabe 2008-04-01
7312160 Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Hiroaki Tomimori 2007-12-25
7312186 Cleaning solution for semiconductor substrate Masayuki Takashima, Yoshiko Kasama, Hiroaki Tomimori 2007-12-25
7268087 Manufacturing method of semiconductor device Hiroaki Tomimori, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni 2007-09-11
7192835 Method of forming a high-k film on a semiconductor device Hiroaki Tomimori, Toshiyuki Iwamoto 2007-03-20
7186354 Anticorrosive treating concentrate Hiroaki Tomimori, Masayuki Takashima 2007-03-06
7170172 Semiconductor device having a roughened surface Hiroaki Tomimori, Kaoru Mikagi, Akira Furuya, Tetsuya Tao 2007-01-30
7141121 Semiconductor washing solution and method of producing semiconductor device using the same 2006-11-28
7138362 Washing liquid composition for semiconductor substrate Yumiko Abe, Norio Ishikawa, Hiroaki Tomimori, Yoshiko Kasama 2006-11-21
7087562 Post-CMP washing liquid composition Yumiko Abe, Takuo Oowada, Norio Ishikawa, Hiroaki Tomimori 2006-08-08
7087494 Method for manufacturing semiconductor device and semiconductor device Tatsuya Suzuki 2006-08-08
6998352 Cleaning method, method for fabricating semiconductor device and cleaning solution Hiroaki Tomimori, Kenichi Yamamoto 2006-02-14
6992050 Stripping agent composition and method of stripping Tatsuya Koita, Keiji Hirano, Hiroaki Tomimori 2006-01-31
6964724 Etching and cleaning methods and etching and cleaning apparatuses used therefor Shinya Yamasaki 2005-11-15