Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
HA

Hidemitsu Aoki — 70 Patents

Nec: 35 patents #179 of 14,502Top 2%
NENec Electronics: 32 patents #5 of 1,789Top 1%
KKKanto Kagaku: 8 patents #7 of 181Top 4%
RERenesas Electronics: 4 patents #1,016 of 4,529Top 25%
OROrgano: 2 patents #52 of 167Top 35%
SCSumitomo Chemical: 2 patents #1,792 of 4,033Top 45%
KCKanto Chemical Co.: 1 patents #15 of 30Top 50%
Overall (All Time): #29,186 of 4,157,543Top 1%
70 Patents All Time
Hidemitsu Aoki has been granted 70 US patents while listed as an inventor at Nec. The first was granted in 1996 and the most recent in April 2013. Hidemitsu Aoki ranks #29,186 of 4,157,543 US inventors in our database (top 0.70%). Patent records list Hidemitsu Aoki in Tokyo, MO, JP.

Issued Patents All Time

Showing 1–25 of 70 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8420549 Etching and cleaning methods and etching and cleaning apparatuses used therefor Shinya Yamasaki 2013-04-16
8129287 Method for manufacturing semiconductor device and semiconductor device Tatsuya Suzuki 2012-03-06
7943516 Manufacturing method for semiconductor device Tatsuya Suzuki, Takuo Ohwada, Kaoru Ikegami, Norio Ishikawa 2011-05-17
7862658 Etching and cleaning methods and etching and cleaning apparatuses used therefor Shinya Yamasaki 2011-01-04
7718532 Method of forming a high-k film on a semiconductor device Hiroaki Tomimori, Toshiyuki Iwamoto 2010-05-18
7687918 Semiconductor device and method for manufacturing same Yorinobu Kunimune, Mieko Hasegawa, Takamasa Itou, Takeshi Takeda 2010-03-30
7592266 Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Hiroaki Tomimori 2009-09-22
7560372 Process for making a semiconductor device having a roughened surface Hiroaki Tomimori, Kaoru Mikagi, Akira Furuya, Tetsuya Tao 2009-07-14
7442652 Method for removing contamination and method for fabricating semiconductor device Kaori Watanabe 2008-10-28
7402530 Method for manufacturing semiconductor device and semiconductor device Tatsuya Suzuki 2008-07-22
7368064 Cleaning solution and manufacturing method for semiconductor device Tatsuya Suzuki, Takuo Ohwada, Kaoru Ikegami, Norio Ishikawa 2008-05-06
7351354 Tungsten metal removing solution and method for removing tungsten metal by use thereof Toshikazu Shimizu, Kaori Watanabe 2008-04-01
7312160 Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Hiroaki Tomimori 2007-12-25
7312186 Cleaning solution for semiconductor substrate Masayuki Takashima, Yoshiko Kasama, Hiroaki Tomimori 2007-12-25
7268087 Manufacturing method of semiconductor device Hiroaki Tomimori, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni 2007-09-11 $30,000
7192835 Method of forming a high-k film on a semiconductor device Hiroaki Tomimori, Toshiyuki Iwamoto 2007-03-20 $30,000
7186354 Anticorrosive treating concentrate Hiroaki Tomimori, Masayuki Takashima 2007-03-06 $23,000
7170172 Semiconductor device having a roughened surface Hiroaki Tomimori, Kaoru Mikagi, Akira Furuya, Tetsuya Tao 2007-01-30 $33,000
7141121 Semiconductor washing solution and method of producing semiconductor device using the same 2006-11-28 $22,000
7138362 Washing liquid composition for semiconductor substrate Yumiko Abe, Norio Ishikawa, Hiroaki Tomimori, Yoshiko Kasama 2006-11-21 $15,000
7087562 Post-CMP washing liquid composition Yumiko Abe, Takuo Oowada, Norio Ishikawa, Hiroaki Tomimori 2006-08-08 $37,000
7087494 Method for manufacturing semiconductor device and semiconductor device Tatsuya Suzuki 2006-08-08 $37,000
6998352 Cleaning method, method for fabricating semiconductor device and cleaning solution Hiroaki Tomimori, Kenichi Yamamoto 2006-02-14 $24,000
6992050 Stripping agent composition and method of stripping Tatsuya Koita, Keiji Hirano, Hiroaki Tomimori 2006-01-31 $61,000
6964724 Etching and cleaning methods and etching and cleaning apparatuses used therefor Shinya Yamasaki 2005-11-15 $40,000