Issued Patents All Time
Showing 1–25 of 114 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10975744 | Exhaust gas purification apparatus for motor vehicles | — | 2021-04-13 |
| 10280822 | Exhaust gas purifying apparatus | — | 2019-05-07 |
| 8956289 | Vital information measuring device | Kazumi Kitajima, Yoshiroh Nagai, Koji Yamamoto | 2015-02-17 |
| 8513140 | Post-dry etching cleaning liquid composition and process for fabricating semiconductor device | Masafumi Muramatsu, Kazumi Asada, Yukino Hagino, Atsushi Okuyama, Takahito Nakajima +4 more | 2013-08-20 |
| 8323880 | Positive resist processing liquid composition and liquid developer | Yutaka Murakami, Taku Murata, Kenji Saito, Ryosuke Araki | 2012-12-04 |
| 8123976 | Alkaline aqueous solution composition used for washing or etching substrates | — | 2012-02-28 |
| 7943516 | Manufacturing method for semiconductor device | Hidemitsu Aoki, Tatsuya Suzuki, Takuo Ohwada, Kaoru Ikegami | 2011-05-17 |
| 7896970 | Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process | Hiroshi Tomita, Yuji Yamada, Hiroaki Yamada, Yumiko Abe | 2011-03-01 |
| 7816313 | Photoresist residue remover composition and semiconductor circuit element production process employing the same | Hiroshi Kawamoto, Mikie Miyasato, Takuo Oowada | 2010-10-19 |
| 7668408 | Support apparatus for optical characteristic measurement, and program product used for same | Naoki Kimura, Toru Kobayashi | 2010-02-23 |
| 7563754 | Composition for removing photoresist residue and polymer residue | Takuo Oowada, Kaoru Ikegami | 2009-07-21 |
| 7507350 | Etching liquid composition | Kiyoto Mori | 2009-03-24 |
| 7503982 | Method for cleaning semiconductor substrate | Yumiko Abe | 2009-03-17 |
| 7385701 | Standard plane sample and optical characteristic measurement system | Koji Watanabe, Masao Nakamuro | 2008-06-10 |
| 7368064 | Cleaning solution and manufacturing method for semiconductor device | Hidemitsu Aoki, Tatsuya Suzuki, Takuo Ohwada, Kaoru Ikegami | 2008-05-06 |
| 7138362 | Washing liquid composition for semiconductor substrate | Yumiko Abe, Hidemitsu Aoki, Hiroaki Tomimori, Yoshiko Kasama | 2006-11-21 |
| 7087562 | Post-CMP washing liquid composition | Yumiko Abe, Takuo Oowada, Hidemitsu Aoki, Hiroaki Tomimori | 2006-08-08 |
| 7084097 | Cleaning solution for substrates of electronic materials | Yumiko Abe, Kiyoto Mori | 2006-08-01 |
| 7073518 | Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device | Yoshitaka Kinomura, Hideki Hijiya | 2006-07-11 |
| 6914039 | Etching liquid composition | Kiyoto Mori | 2005-07-05 |
| 6877518 | Chemical solution treatment apparatus for semiconductor substrate | Kaori Watanabe, Hidemitsu Aoki, Kiyoto Mori | 2005-04-12 |
| 6864044 | Photoresist residue removing liquid composition | Takuo Oowada | 2005-03-08 |
| 6787293 | Photoresist residue remover composition | Takuo Oowada, Hidemitsu Aoki, Kenichi Nakabeppu, Yoshiko Kasama | 2004-09-07 |
| 6730644 | Cleaning solution for substrates of electronic materials | Yumiko Abe, Kiyoto Mori | 2004-05-04 |
| 6614518 | Multi-point light measuring system | Norihisa Hosoi, Susumu Shirai, Michio Nishio, Ryuji Tsuji, Tomoya Kimata | 2003-09-02 |