| 7786005 |
Method for manufacturing semiconductor device to form a via hole |
Kenichi Yamamoto, Masashige Moritoki, Takashi Shimane, Kazumi Saito, Takamasa Itou +2 more |
2010-08-31 |
| 7718532 |
Method of forming a high-k film on a semiconductor device |
Hidemitsu Aoki, Toshiyuki Iwamoto |
2010-05-18 |
| 7592266 |
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device |
Hidemitsu Aoki |
2009-09-22 |
| 7560372 |
Process for making a semiconductor device having a roughened surface |
Hidemitsu Aoki, Kaoru Mikagi, Akira Furuya, Tetsuya Tao |
2009-07-14 |
| 7312186 |
Cleaning solution for semiconductor substrate |
Masayuki Takashima, Yoshiko Kasama, Hidemitsu Aoki |
2007-12-25 |
| 7312160 |
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device |
Hidemitsu Aoki |
2007-12-25 |
| 7268087 |
Manufacturing method of semiconductor device |
Hidemitsu Aoki, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni |
2007-09-11 |
| 7192835 |
Method of forming a high-k film on a semiconductor device |
Hidemitsu Aoki, Toshiyuki Iwamoto |
2007-03-20 |
| 7186354 |
Anticorrosive treating concentrate |
Hidemitsu Aoki, Masayuki Takashima |
2007-03-06 |
| 7170172 |
Semiconductor device having a roughened surface |
Hidemitsu Aoki, Kaoru Mikagi, Akira Furuya, Tetsuya Tao |
2007-01-30 |
| 7138362 |
Washing liquid composition for semiconductor substrate |
Yumiko Abe, Norio Ishikawa, Hidemitsu Aoki, Yoshiko Kasama |
2006-11-21 |
| 7087562 |
Post-CMP washing liquid composition |
Yumiko Abe, Takuo Oowada, Norio Ishikawa, Hidemitsu Aoki |
2006-08-08 |
| 6998352 |
Cleaning method, method for fabricating semiconductor device and cleaning solution |
Hidemitsu Aoki, Kenichi Yamamoto |
2006-02-14 |
| 6992050 |
Stripping agent composition and method of stripping |
Tatsuya Koita, Keiji Hirano, Hidemitsu Aoki |
2006-01-31 |
| 6897150 |
Semiconductor wafer surface and method of treating a semiconductor wafer surface |
Hidemitsu Aoki |
2005-05-24 |
| 6890864 |
Semiconductor device fabricating method and treating liquid |
Hidemitsu Aoki, Kenichi Nakabeppu, Toshiyuki Takewaki, Nobuo Hironaga, Hiroyuki Kunishima |
2005-05-10 |
| 6864187 |
Method of washing a semiconductor wafer |
Hidemitsu Aoki |
2005-03-08 |
| 6797648 |
Cleaning water for cleaning a wafer and method of cleaning a wafer |
Hidemitsu Aoki |
2004-09-28 |
| 6787480 |
Manufacturing method of semicondcutor device |
Hidemitsu Aoki, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni |
2004-09-07 |
| 6592677 |
Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions |
Hidemitsu Aoki |
2003-07-15 |