Hiroaki Tomimori — 20 Patents at Nec Electronics

Hiroaki Tomimori has been granted 20 US patents while listed as an inventor at Nec Electronics. The first was granted in 2003 and the most recent in August 2010. Hiroaki Tomimori ranks #214,803 of 4,157,543 US inventors in our database (top 5.2%). Patent records list Hiroaki Tomimori in Tokyo, JP.

Patents per Year

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Showing 1–20 of 20 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
7786005	Method for manufacturing semiconductor device to form a via hole	Kenichi Yamamoto, Masashige Moritoki, Takashi Shimane, Kazumi Saito, Takamasa Itou +2 more	2010-08-31
7718532	Method of forming a high-k film on a semiconductor device	Hidemitsu Aoki, Toshiyuki Iwamoto	2010-05-18
7592266	Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device	Hidemitsu Aoki	2009-09-22
7560372	Process for making a semiconductor device having a roughened surface	Hidemitsu Aoki, Kaoru Mikagi, Akira Furuya, Tetsuya Tao	2009-07-14
7312186	Cleaning solution for semiconductor substrate	Masayuki Takashima, Yoshiko Kasama, Hidemitsu Aoki	2007-12-25
7312160	Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device	Hidemitsu Aoki	2007-12-25
7268087	Manufacturing method of semiconductor device	Hidemitsu Aoki, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni	2007-09-11	$30,000
7192835	Method of forming a high-k film on a semiconductor device	Hidemitsu Aoki, Toshiyuki Iwamoto	2007-03-20	$30,000
7186354	Anticorrosive treating concentrate	Hidemitsu Aoki, Masayuki Takashima	2007-03-06	$23,000
7170172	Semiconductor device having a roughened surface	Hidemitsu Aoki, Kaoru Mikagi, Akira Furuya, Tetsuya Tao	2007-01-30	$33,000
7138362	Washing liquid composition for semiconductor substrate	Yumiko Abe, Norio Ishikawa, Hidemitsu Aoki, Yoshiko Kasama	2006-11-21	$15,000
7087562	Post-CMP washing liquid composition	Yumiko Abe, Takuo Oowada, Norio Ishikawa, Hidemitsu Aoki	2006-08-08	$37,000
6998352	Cleaning method, method for fabricating semiconductor device and cleaning solution	Hidemitsu Aoki, Kenichi Yamamoto	2006-02-14	$24,000
6992050	Stripping agent composition and method of stripping	Tatsuya Koita, Keiji Hirano, Hidemitsu Aoki	2006-01-31	$61,000
6897150	Semiconductor wafer surface and method of treating a semiconductor wafer surface	Hidemitsu Aoki	2005-05-24	$32,000
6890864	Semiconductor device fabricating method and treating liquid	Hidemitsu Aoki, Kenichi Nakabeppu, Toshiyuki Takewaki, Nobuo Hironaga, Hiroyuki Kunishima	2005-05-10	$24,000
6864187	Method of washing a semiconductor wafer	Hidemitsu Aoki	2005-03-08	$50,000
6797648	Cleaning water for cleaning a wafer and method of cleaning a wafer	Hidemitsu Aoki	2004-09-28	$66,000
6787480	Manufacturing method of semicondcutor device	Hidemitsu Aoki, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni	2004-09-07	$28,000
6592677	Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions	Hidemitsu Aoki	2003-07-15	$20,000

Hiroaki Tomimori — 20 Patents

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