Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7816312 | Composition for photoresist stripping solution and process of photoresist stripping | Kaoru Ikegami | 2010-10-19 |
| 7816313 | Photoresist residue remover composition and semiconductor circuit element production process employing the same | Hiroshi Kawamoto, Mikie Miyasato, Norio Ishikawa | 2010-10-19 |
| 7563754 | Composition for removing photoresist residue and polymer residue | Kaoru Ikegami, Norio Ishikawa | 2009-07-21 |
| 7087562 | Post-CMP washing liquid composition | Yumiko Abe, Norio Ishikawa, Hidemitsu Aoki, Hiroaki Tomimori | 2006-08-08 |
| 6864044 | Photoresist residue removing liquid composition | Norio Ishikawa | 2005-03-08 |
| 6787293 | Photoresist residue remover composition | Norio Ishikawa, Hidemitsu Aoki, Kenichi Nakabeppu, Yoshiko Kasama | 2004-09-07 |