Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7507350 | Etching liquid composition | Norio Ishikawa | 2009-03-24 |
| 7084097 | Cleaning solution for substrates of electronic materials | Norio Ishikawa, Yumiko Abe | 2006-08-01 |
| 6914039 | Etching liquid composition | Norio Ishikawa | 2005-07-05 |
| 6877518 | Chemical solution treatment apparatus for semiconductor substrate | Kaori Watanabe, Hidemitsu Aoki, Norio Ishikawa | 2005-04-12 |
| 6730644 | Cleaning solution for substrates of electronic materials | Norio Ishikawa, Yumiko Abe | 2004-05-04 |
| 6558463 | Solution and method for forming a ferroelectric film | Takashi Hase, Yoichi Miyasaka, Toshinobu Shinnai, Hiroshi Morioka, Taku Yamate +1 more | 2003-05-06 |
| 6485779 | Solution for forming ferroelectric film and method for forming ferroelectric film | Akira Kamisawa, Hayato Katsuragi, Taku Yamate | 2002-11-26 |
| 6468357 | Remover for a ruthenium containing metal and use thereof | Hidemitsu Aoki, Kaori Watanabe, Norio Ishikawa | 2002-10-22 |
| 6231677 | Photoresist stripping liquid composition | Norio Ishikawa, Masanori Suga | 2001-05-15 |
| 6086665 | Solution for forming ferroelectric film and method for forming ferroelectric film | Akira Kamisawa, Hayato Katsuragi, Taku Yamate | 2000-07-11 |
| 6080709 | Cleaning solution for cleaning substrates to which a metallic wiring has been applied | Norio Ishikawa, Hidemitsu Aoki | 2000-06-27 |
| 5885901 | Rinsing solution after resist stripping process and method for manufacturing semiconductor device | Hideto Gotoh, Masao Miyazaki | 1999-03-23 |
| 5326490 | Surface tension sulfuric acid composition | Takao Shihoya, Hisao Hara | 1994-07-05 |
| 5084483 | Process and apparatus for recovering and reusing resist composition | Asaaki Yamashita, Tsugio Saito, Shiro Shimauchi | 1992-01-28 |
| 4967782 | Process and apparatus for recovering and reusing resist composition | Asaaki Yamashita, Tsugio Saito, Shiro Shimauchi | 1990-11-06 |
| 4914006 | Positive resist quaternary ammonium hydroxide containing developer with cationic and nonionic surfactant | Tiharu Kato, Kazuyuki Saito, Norio Ishikawa | 1990-04-03 |
| 4525523 | Negative-working photoresist coating composition | Hatsuo Nakamura, Tiharu Kato, Toshio Yonezawa, Shigeo Koguchi, Masahiko Igarashi | 1985-06-25 |