TO

Takuo Ohwada

KK Kanto Kagaku: 9 patents #6 of 181Top 4%
KT Kabushiki Kaisha Toshiba: 1 patents #13,537 of 21,451Top 65%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
SO Sony: 1 patents #17,262 of 25,231Top 70%
Overall (All Time): #553,151 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
11732365 Composition for removing ruthenium Itsuki KASHIWAGI 2023-08-22
11512397 Etchant composition and method for etching Ryou Kouno 2022-11-29
11279904 Cleaning liquid composition Kikue Morita, Areji Takanaka 2022-03-22
11046910 Cleaning solution composition Yumiko Taniguchi, Areji Takanaka 2021-06-29
9334470 Cleaning liquid composition for electronic device Yumiko Taniguchi, Kikue Morita, Chiyoko Horike 2016-05-10
8513140 Post-dry etching cleaning liquid composition and process for fabricating semiconductor device Masafumi Muramatsu, Kazumi Asada, Yukino Hagino, Atsushi Okuyama, Takahito Nakajima +4 more 2013-08-20
8105998 Liquid composition for removing photoresist residue and polymer residue 2012-01-31
7943516 Manufacturing method for semiconductor device Hidemitsu Aoki, Tatsuya Suzuki, Kaoru Ikegami, Norio Ishikawa 2011-05-17
7368064 Cleaning solution and manufacturing method for semiconductor device Hidemitsu Aoki, Tatsuya Suzuki, Kaoru Ikegami, Norio Ishikawa 2008-05-06