Issued Patents All Time
Showing 26–50 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6949465 | Preparation process for semiconductor device | Kenichi Tokioka, Yoshiko Kasama, Tatsuya Koito, Keiji Hirano | 2005-09-27 |
| 6897150 | Semiconductor wafer surface and method of treating a semiconductor wafer surface | Hiroaki Tomimori | 2005-05-24 |
| 6890391 | Method of manufacturing semiconductor device and apparatus for cleaning substrate | Yoshiko Kasama, Tatsuya Suzuki | 2005-05-10 |
| 6890864 | Semiconductor device fabricating method and treating liquid | Kenichi Nakabeppu, Hiroaki Tomimori, Toshiyuki Takewaki, Nobuo Hironaga, Hiroyuki Kunishima | 2005-05-10 |
| 6877518 | Chemical solution treatment apparatus for semiconductor substrate | Kaori Watanabe, Norio Ishikawa, Kiyoto Mori | 2005-04-12 |
| 6869921 | Stripping composition | Tatsuya Koito, Keiji Hirano, Masayuki Takashima, Kenichi Tokioka | 2005-03-22 |
| 6864187 | Method of washing a semiconductor wafer | Hiroaki Tomimori | 2005-03-08 |
| 6833109 | Method and apparatus for storing a semiconductor wafer after its CMP polishing | Shinya Yamasaki | 2004-12-21 |
| 6797648 | Cleaning water for cleaning a wafer and method of cleaning a wafer | Hiroaki Tomimori | 2004-09-28 |
| 6787293 | Photoresist residue remover composition | Takuo Oowada, Norio Ishikawa, Kenichi Nakabeppu, Yoshiko Kasama | 2004-09-07 |
| 6787480 | Manufacturing method of semicondcutor device | Hiroaki Tomimori, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni | 2004-09-07 |
| 6767409 | Method for cleaning semiconductor wafer after chemical mechanical polishing on copper wiring | Shinya Yamasaki | 2004-07-27 |
| 6695683 | Semiconductor device washing apparatus and a method of washing a semiconductor device | — | 2004-02-24 |
| 6683007 | Etching and cleaning methods and etching and cleaning apparatus used therefor | Shinya Yamasaki | 2004-01-27 |
| 6624061 | Semiconductor device and method of manufacturing the same capable of reducing deterioration of low dielectric constant film | — | 2003-09-23 |
| 6592677 | Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions | Hiroaki Tomimori | 2003-07-15 |
| 6551945 | Process for manufacturing a semiconductor device | Kaori Watanabe | 2003-04-22 |
| 6524376 | Anticorrosive agent | Tatsuya Koito, Kenichi Nakabeppu | 2003-02-25 |
| 6468357 | Remover for a ruthenium containing metal and use thereof | Kaori Watanabe, Norio Ishikawa, Kiyoto Mori | 2002-10-22 |
| 6465352 | Method for removing dry-etching residue in a semiconductor device fabricating process | — | 2002-10-15 |
| 6444583 | Substrate-cleaning method and substrate-cleaning solution | — | 2002-09-03 |
| 6423148 | Substrate-cleaning method and substrate-cleaning solution | — | 2002-07-23 |
| 6387821 | Method of manufacturing a semiconductor device | — | 2002-05-14 |
| 6387190 | Method for cleaning semiconductor wafer after chemical mechanical polishing on copper wiring | Shinya Yamasaki | 2002-05-14 |
| 6319801 | Method for cleaning a substrate and cleaning solution | Tomoko Wake | 2001-11-20 |