Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma control using dual cathode frequency mixing

Plasma control using dual cathode frequency mixing

US Patent 7838430 · Granted Nov 23, 2010

Estimated economic value: $4,531,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus to produce a waveform2025
Secure certificate or key distribution for synchronous mobile device management 2025
Substrate location detection and adjustment2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
Metal contamination reduction in substrate processing systems with transformer c2025
Method and system for automated frequency tuning of radiofrequency (RF) signal g2025
Protection system for switches in direct drive circuits of substrate processing 2025
Non-elastomeric, non-polymeric, non-metallic membrane valves for semiconductor p2025
Dual-frequency, direct-drive inductively coupled plasma source2024
Apparatus to control a waveform2024
Systems and methods for monitoring faults, anomalies, and other characteristics 2024
Etching isolation features and dense features within a substrate2024