Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence

Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence

US Patent 6692579 · Granted Feb 17, 2004

Estimated economic value: $1,196,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

3D visualization enhancement for depth perception and collision avoidance2025
Monitoring air pressure within a cell processing system2025
Water vapor plasma to enhance surface hydrophilicity2025
Nanocrystalline diamond with amorphous interfacial layer2025
Molybdenum(0) precursors for deposition of molybdenum films2025
Self field-suppression CVD tungsten (W) fill on PVD W liner2025
Metal oxide preclean for bottom-up gapfill in MEOL and BEOL2025
Process chamber manifold2025
One chamber multi-station selective metal removal2025
Methods to reduce UNCD film roughness2025
Isotropic silicon nitride removal2025
Methods for forming metal gapfill with low resistivity2025