Issued Patents All Time
Showing 76–100 of 111 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7232591 | Method of using an adhesive for temperature control during plasma processing | Toshinari Nitta | 2007-06-19 |
| 7199064 | Plasma processing method and apparatus | Ichiro Nakayama, Satoshi Maeshima, Bunji Mizuno, Yuichiro Sasaki | 2007-04-03 |
| 7192854 | Method of plasma doping | Yuichiro Sasaki, Bunji Mizuno, Ichiro Nakayama, Hisataka Kanada | 2007-03-20 |
| 7176402 | Method and apparatus for processing electronic parts | Kenichiro Suetsugu, Hiroshi Kawazoe, Mitsuo Saitoh, Akio Furusawa | 2007-02-13 |
| 7157659 | Plasma processing method and apparatus | Yoichiro Yashiro, Tadashi Kimura, Mitsuo Saitoh | 2007-01-02 |
| 7135089 | Method and apparatus for plasma processing | Ichiro Nakayama | 2006-11-14 |
| 7056416 | Atmospheric pressure plasma processing method and apparatus | Tadashi Kimura, Yoichiro Yashiro, Kenichi Sato, Mitsuo Saitoh | 2006-06-06 |
| 7022615 | Plasma processing method | Mitsuo Saitoh | 2006-04-04 |
| 7022937 | Plasma processing method and apparatus for performing uniform plasma processing on a linear portion of an object | Mitsuo Saitoh | 2006-04-04 |
| 6905625 | Plasma processing method and apparatus | Takayuki Kai, Yoichiro Yashiro | 2005-06-14 |
| 6893971 | Dry etching method and apparatus | Hiroshi Tanabe, Hiroshi Imai | 2005-05-17 |
| 6875307 | Method and apparatus for plasma processing | Ichiro Nakayama | 2005-04-05 |
| 6864640 | Plasma processing method and apparatus thereof | Yukihiro Maegawa, Izuru Matsuda | 2005-03-08 |
| 6830653 | Plasma processing method and apparatus | Yukihiro Maegawa, Izuru Matsuda, Takayuki Kai, Mitsuo Saitoh | 2004-12-14 |
| 6808759 | Plasma processing method and apparatus | Hideo Haraguchi, Takuya Matsui, Izuru Matsuda, Akio Mitsuhashi | 2004-10-26 |
| 6707253 | Matching circuit and plasma processing apparatus | Kenji Sumida, Yukihiro Maegawa, Ichiro Nakayama, Kibatsu Shinohara, Minoru Kanda +1 more | 2004-03-16 |
| 6630792 | High frequency power source, plasma processing apparatus, inspection method for plasma processing apparatus, and plasma processing method | — | 2003-10-07 |
| 6517670 | Etching and cleaning apparatus | Hiroshi Imai | 2003-02-11 |
| 6432730 | Plasma processing method and apparatus | Takuya Matsui | 2002-08-13 |
| 6355573 | Plasma processing method and apparatus | Masaki Suzuki, Takuya Matsui | 2002-03-12 |
| 6346915 | Plasma processing method and apparatus | Takuya Matsui | 2002-02-12 |
| 6342139 | Sputtering system | Isamu Aokura, Naoki Suzuki | 2002-01-29 |
| 6297165 | Etching and cleaning methods | Hiroshi Imai | 2001-10-02 |
| 6291937 | High frequency coupler, and plasma processing apparatus and method | Shozo Watanabe | 2001-09-18 |
| 6177646 | Method and device for plasma treatment | Ichiro Nakayama, Shozo Watanabe, Hideo Haraguchi | 2001-01-23 |