IN

Ichiro Nakayama

PA Panasonic: 30 patents #516 of 21,108Top 3%
Sumitomo Electric Industries: 26 patents #641 of 21,551Top 3%
SE Seiko Epson: 2 patents #4,555 of 7,774Top 60%
MC Matsushit Electric Industrial Co.: 1 patents #13 of 293Top 5%
SC Shinagawa Fuel Co.: 1 patents #7 of 10Top 70%
SC Shinanen New Ceramic: 1 patents #5 of 12Top 45%
Overall (All Time): #35,970 of 4,157,543Top 1%
63
Patents All Time

Issued Patents All Time

Showing 26–50 of 63 patents

Patent #TitleCo-InventorsDate
7601619 Method and apparatus for plasma processing Tomohiro Okumura, Yuichiro Sasaki, Katsumi Okashita, Hiroyuki Ito, Bunji Mizuno +1 more 2009-10-13
7582492 Method of doping impurities, and electronic element using the same Cheng Jin, Yuichiro Sasaki, Bunji Mizuno, Katsumi Okashita, Hiroyuki Ito +2 more 2009-09-01
7575987 Method of plasma doping Tomohiro Okumura, Bunji Mizuno 2009-08-18
7547619 Method of introducing impurity, device and element Yuichiro Sasaki, Bunji Mizuno 2009-06-16
7510667 Plasma processing method and apparatus Tomohiro Okumura 2009-03-31
7465407 Plasma processing method and apparatus Mitsuo Saitoh, Tomohiro Okumura 2008-12-16
7456085 Method for introducing impurities Yuichiro Sasaki, Tomohiro Okumura, Bunji Mizuno, Cheng Jin, Satoshi Maeshima +1 more 2008-11-25
7378031 Liquid phase etching method and liquid phase etching apparatus Bunji Mizuno, Yuichiro Sasaki, Hisataka Kanada 2008-05-27
D561666 Foot brake lock 2008-02-12
7294462 Method for detection of base sequence of interest Hisanori Nasu, Hiroaki Ono, Akito Mugita, Takanori Kobayashi, Tetsuji Masaoka +2 more 2007-11-13
7205250 Plasma processing method and apparatus Yoshihiro Yanagi 2007-04-17
7199064 Plasma processing method and apparatus Tomohiro Okumura, Satoshi Maeshima, Bunji Mizuno, Yuichiro Sasaki 2007-04-03
7192854 Method of plasma doping Yuichiro Sasaki, Bunji Mizuno, Hisataka Kanada, Tomohiro Okumura 2007-03-20
7135089 Method and apparatus for plasma processing Tomohiro Okumura 2006-11-14
6875307 Method and apparatus for plasma processing Tomohiro Okumura 2005-04-05
6784080 Method of manufacturing semiconductor device by sputter doping Bunji Mizuno, Hiroaki Nakaoka, Michihiko Takase 2004-08-31
6707253 Matching circuit and plasma processing apparatus Kenji Sumida, Tomohiro Okumura, Yukihiro Maegawa, Kibatsu Shinohara, Minoru Kanda +1 more 2004-03-16
6217951 Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device Bunji Mizuno, Hiroaki Nakaoka, Michihiko Takase 2001-04-17
6177646 Method and device for plasma treatment Tomohiro Okumura, Shozo Watanabe, Hideo Haraguchi 2001-01-23
6093457 Method for plasma processing Tomohiro Okumura 2000-07-25
6030667 Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma Hideo Nakagawa, Shigenori Hayashi, Tomohiro Okumura 2000-02-29
5922223 Plasma processing method and apparatus Tomohiro Okumura, Hideo Haraguchi, Yoshihiro Yanagi 1999-07-13
5916820 Thin film forming method and apparatus Tomohiro Okumura, Yuichiro Yamada, Naoki Suzuki 1999-06-29
5888413 Plasma processing method and apparatus Tomohiro Okumura, Yoshihiro Yanagi 1999-03-30
5851906 Impurity doping method Bunji Mizuno, Hiroaki Nakaoka, Michihiko Takase 1998-12-22