Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8096744 | Wafer processing system, wafer processing method, and ion implantation system | Keiji Okada, Fumiaki Sato | 2012-01-17 |
| 7067382 | Semiconductor device and method for fabricating the same | Kentaro Nakanishi, Hiroyuki Umimoto, Atsuhiro Kajiya | 2006-06-27 |
| 7033874 | Method of forming insulating film and method of fabricating semiconductor device including plasma bias for forming a second insulating film | Kazuichiro Itonaga, Akihiro Yamamoto, Isao Miyanaga, Yoshinao Harada | 2006-04-25 |
| 7015554 | Semiconductor device and method for fabricating the same | Akio Sebe, Takayuki Yamada | 2006-03-21 |
| 6995415 | Semiconductor device and its manufacturing method | Hisashi Ogawa, Atsuhiro Kajiya, Shin Hashimoto, Kyoko Egashira | 2006-02-07 |
| 6884643 | Semiconductor device, method for evaluating the same, and method for fabricating the same | Kentaro Nakanishi | 2005-04-26 |
| 6861375 | Method of fabricating semiconductor device | Atsushi Ishinaga, Hiroko Kubo | 2005-03-01 |
| 6859023 | Evaluation method for evaluating insulating film, evaluation device therefor and method for manufacturing evaluation device | Michinari Yamanaka, Takayuki Yamada, Takeshi Yamashita | 2005-02-22 |
| 6831020 | Method for fabricating semiconductor device | Takayuki Yamada | 2004-12-14 |
| 6800512 | Method of forming insulating film and method of fabricating semiconductor device | Kazuichiro Itonaga, Akihiro Yamamoto, Isao Miyanaga, Yoshinao Harada | 2004-10-05 |
| 6784080 | Method of manufacturing semiconductor device by sputter doping | Bunji Mizuno, Michihiko Takase, Ichiro Nakayama | 2004-08-31 |
| 6770517 | Semiconductor device and method for fabricating the same | Hiromasa Fujimoto, Atsushi Hori, Takashi Uehara, Takehiro Hirai | 2004-08-03 |
| 6337500 | Semiconductor device and method for fabricating the same | Hiromasa Fujimoto, Atsushi Hori, Takashi Uehara, Takehiro Hirai | 2002-01-08 |
| 6217951 | Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device | Bunji Mizuno, Michihiko Takase, Ichiro Nakayama | 2001-04-17 |
| 5851906 | Impurity doping method | Bunji Mizuno, Michihiko Takase, Ichiro Nakayama | 1998-12-22 |
| 5780898 | Semiconductor device with a vertical field effect transistor and method of manufacturing the same | Tokuhiko Tamaki, Tatsuo Sugiyama | 1998-07-14 |
| 5756382 | Manufacturing method of CMOS transistor | Mizuki Segawa, Yoshiaki Kato, Takashi Nakabayashi, Atsushi Hori, Hiroshi Masuda +4 more | 1998-05-26 |
| 5726071 | Manufacturing method of CMOS transistor | Mizuki Segawa, Yoshiaki Kato, Takashi Nakabayashi, Atsushi Hori, Hiroshi Masuda +4 more | 1998-03-10 |
| 5696008 | Semiconductor device and method of manufacturing the same | Tokuhiko Tamaki, Tatsuo Sugiyama | 1997-12-09 |
| 5686340 | Manufacturing method of CMOS transistor | Mizuki Segawa, Yoshiaki Kato, Takashi Nakabayashi, Atsushi Hori, Hiroshi Masuda +4 more | 1997-11-11 |
| 5670810 | Semiconductor device with a vertical field effect transistor | Tokuhiko Tamaki, Tatsuo Sugiyama | 1997-09-23 |
| 5618748 | Manufacturing method of CMOS transistor with no reduction of punch-through voltage | Mizuki Segawa, Yoshiaki Kato, Takashi Nakabayashi, Atsushi Hori, Hiroshi Masuda +4 more | 1997-04-08 |
| 5447872 | Manufacturing method of CMOS transistor including heat treatments of gate electrodes and LDD regions at reducing temperatures | Mizuki Segawa, Yoshiaki Kato, Takashi Nakabayashi, Atsushi Hori, Hiroshi Masuda +4 more | 1995-09-05 |
| 5428244 | Semiconductor device having a silicon rich dielectric layer | Mizuki Segawa, Yoshiaki Kato | 1995-06-27 |
| 5409847 | Manufacturing method of CMOS transistor in which heat treatment at higher temperature is done prior to heat treatment at low temperature | Mizuki Segawa, Yoshiaki Kato, Takashi Nakabayashi, Atsushi Hori, Hiroshi Masuda +4 more | 1995-04-25 |