MF

Moshe Finarov

NI Nova Measuring Instruments: 77 patents #1 of 108Top 1%
WC Wuhan Dr Laser Technology Corp,.: 3 patents #2 of 14Top 15%
OR Orbotech: 2 patents #49 of 175Top 30%
Overall (All Time): #19,141 of 4,157,543Top 1%
87
Patents All Time

Issued Patents All Time

Showing 51–75 of 87 patents

Patent #TitleCo-InventorsDate
7195540 Method and system for endpoint detection 2007-03-27
7169015 Apparatus for optical inspection of wafers during processing 2007-01-30
7122817 Lateral shift measurement using an optical technique Boaz Brill, David Schiener 2006-10-17
7030957 Monitoring apparatus and method particularly useful in photolithographically processing substrates Giora Dishon, Zvi Nirel, Yoel Cohen 2006-04-18
7019850 Method and system for thin film characterization 2006-03-28
6974962 Lateral shift measurement using an optical technique Boaz Brill, David Scheiner 2005-12-13
6842220 Monitoring apparatus and method particularly useful in photolithographically processing substrates Giora Dishon, Yoel Cohen, Zvi Nirel 2005-01-11
6833048 Apparatus for in-cassette monitoring of semiconductor wafers Rani Kipper 2004-12-21
6806971 Method and apparatus for process control in semiconductor manufacture 2004-10-19
6801315 Method and system for overlay measurement David Scheiner 2004-10-05
6801326 Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects David Scheiner, Avi Ravid 2004-10-05
6791686 Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereof 2004-09-14
6764379 Method and system for endpoint detection 2004-07-20
6752689 Apparatus for optical inspection of wafers during polishing 2004-06-22
6733619 Apparatus for integrated monitoring of wafers and for process control in semiconductor manufacturing and a method for use thereof 2004-05-11
6720568 Method and system for optical inspection of a structure formed with a surface relief Yoel Cohen 2004-04-13
6657736 Method and system for measuring patterned structures Boaz Brill 2003-12-02
6650424 Method and system for measuring in patterned structures Boaz Brill 2003-11-18
6643017 Method and system for controlling the photolithography process Yoel Cohen 2003-11-04
6603529 Monitoring apparatus and method particularly useful in photolithographically processing substrates 2003-08-05
RE38153 Two-dimensional beam deflector 2003-06-24
6426502 Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereof 2002-07-30
6424417 Method and system for controlling the photolithography process Yoel Cohen 2002-07-23
6407809 Optical inspection system and method Natalie Levinsohn, Shay Ghilai 2002-06-18
6368182 Apparatus for optical inspection of wafers during polishing Eran Dvir, Eli Haimovich, Benjamin Shulman, Rony Abaron 2002-04-09