Issued Patents All Time
Showing 26–50 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10240122 | Active-ester-group-containing composition for producing fibers, and cell culture scaffold material using fibers produced from active-ester-group-containing composition | Makiko Umezaki, Taito Nishino, Ayako OTANI, Kenichiro Kamei, Li Liu +1 more | 2019-03-26 |
| 10222697 | Photosensitive fiber and method for manufacturing same | Yoshiyuki Yokoyama | 2019-03-05 |
| 10202528 | Polymer and composition including same, and adhesive composition | Mamoru TAMURA, Takuya OHASHI, Tomoyuki Enomoto | 2019-02-12 |
| 10092687 | Blood filter and method for manufacturing the same | Tatsuro KANAKI, Taito Nishino, Yoshiomi Hiroi, Ayako OTANI, Tomoyuki Ozawa | 2018-10-09 |
| 9957644 | Fiber-forming composition and bio-compatible material using said fiber | Makiko Umezaki, Taito Nishino, Ayako OTANI | 2018-05-01 |
| 9822330 | Light-degradable material, substrate, and method for patterning the substrate | Shigeo Kimura, Yoshiomi Hiroi, Yuki Usui, Hiromi Kitano, Tadashi Nakaji +1 more | 2017-11-21 |
| 9678427 | Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain | Hiroto OGATA, Yoshiomi Hiroi, Tomoya Ohashi, Yuki Usui | 2017-06-13 |
| 9524871 | Silicon-containing resist underlayer film-forming composition having sulfone structure | Makoto Nakajima, Daisuke SAKUMA, Yuta Kanno | 2016-12-20 |
| 9436085 | Composition for forming photosensitive resist underlayer film | Yusuke Horiguchi, Makiko Umezaki, Noriaki Fujitani, Hirokazu Nishimaki, Takahiro Hamada | 2016-09-06 |
| 9348222 | Positive resist composition and method for production of microlens | Shojiro Yukawa, Takahiro Sakaguchi, Hiroyuki Soda | 2016-05-24 |
| 9340561 | Organic silicon compound and silane coupling agent containing the same | Makiko Umezaki, Daisuke SAKUMA, Taito Nishino, Yoshiomi Hiroi, Shigeo Kimura +2 more | 2016-05-17 |
| 9214345 | Film-forming composition and ion implantation method | Tomoya Ohashi | 2015-12-15 |
| 9140989 | Photosensitive organic particles | Makiko Umezaki, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui | 2015-09-22 |
| 9023583 | Monolayer or multilayer forming composition | Daisuke SAKUMA, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui | 2015-05-05 |
| 8993699 | Photosensitive resin composition for microlens | Takahiro Sakaguchi | 2015-03-31 |
| 8940470 | Photosensitive resin and process for producing microlens | Takayuki Negi, Takahiro Sakaguchi | 2015-01-27 |
| 8796349 | Photosensitive resin composition for microlenses | Hiroyuki Soda, Takahiro Sakaguchi | 2014-08-05 |
| 8710491 | Forming agent for gate insulating film of thin film transistor | Shinichi Maeda | 2014-04-29 |
| 8685615 | Photosensitive resist underlayer film forming composition | Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui | 2014-04-01 |
| 8674043 | Photosensitive resin composition containing copolymer | — | 2014-03-18 |
| 8623745 | Composition for forming gate insulating film for thin-film transistor | Shinichi Maeda | 2014-01-07 |
| 8460855 | Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound | — | 2013-06-11 |
| 8445175 | Composition containing hydroxylated condensation resin for forming resist underlayer film | Yoshiomi Hiroi, Rikimaru Sakamoto | 2013-05-21 |
| 8436339 | Gate insulating film forming agent for thin-film transistor | Shinichi Maeda | 2013-05-07 |
| 8007979 | Acrylic polymer-containing gap fill material forming composition for lithography | Satoshi Takei, Kazuhisa Ishii, Yasushi Sakaida | 2011-08-30 |