TK

Takahiro Kishioka

NI Nissan Chemical Industries: 64 patents #2 of 1,150Top 1%
KU Kyoto University: 1 patents #568 of 1,688Top 35%
TP Toyama Prefecture: 1 patents #13 of 63Top 25%
UT University Of Toyama: 1 patents #3 of 28Top 15%
📍 Toyama, JP: #20 of 1,699 inventorsTop 2%
Overall (All Time): #34,459 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 51–64 of 64 patents

Patent #TitleCo-InventorsDate
7947424 Composition for forming anti-reflective coat Shinya Arase, Ken-ichi Mizusawa, Keisuke Nakayama 2011-05-24
7846638 Composition for forming anti-reflective coating for use in lithography Ken-ichi Mizusawa, Tomoyuki Enomoto, Rikimaru Sakamoto, Keisuke Nakayama, Yasuo Kawamura 2010-12-07
7842620 Method for manufacturing semiconductor device using quadruple-layer laminate Satoshi Takei, Makoto Nakajima, Yasushi Sakaida, Hikaru Imamura, Keisuke Hashimoto 2010-11-30
7816067 Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative Tomoyuki Enomoto, Takahiro Sakaguchi 2010-10-19
7794919 Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound 2010-09-14
7790356 Condensation type polymer-containing anti-reflective coating for semiconductor Rikimaru Sakamoto, Yoshiomi Hiroi, Daisuke Maruyama 2010-09-07
7595144 Sulfonate-containing anti-reflective coating forming composition for lithography Tadashi Hatanaka, Shigeo Kimura 2009-09-29
7501229 Anti-reflective coating containing sulfur atom Yoshiomi Hiroi, Keisuke Nakayama, Rikimaru Sakamoto 2009-03-10
7425399 Composition for forming anti-reflective coating for use in lithography Ken-ichi Mizusawa, Tomoyuki Enomoto, Rikimaru Sakamoto, Keisuke Nakayama, Yasuo Kawamura 2008-09-16
7425403 Composition for forming anti-reflective coating for use in lithography Shinya Arase, Ken-ichi Mizusawa 2008-09-16
7332266 Composition for forming anti-reflective coating for use in lithography Shinya Arase, Ken-ichi Mizusawa 2008-02-19
7326509 Composition for forming anti-reflective coating for use in lithography Shinya Arase, Ken-ichi Mizusawa 2008-02-05
7226721 Underlayer coating forming composition for lithography containing compound having protected carboxyl group Satoshi Takei, Yasushi Sakaida, Tetsuya Shinjo 2007-06-05
6927266 Bottom anti-reflective coat forming composition for lithography Shinya Arase, Ken-ichi Mizusawa 2005-08-09