Issued Patents All Time
Showing 26–50 of 107 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6831731 | Projection optical system and an exposure apparatus with the projection optical system | Yasuhiro Omura, Issey Tanaka, Soichi Owa, Toshihiko Ozawa, Shunsuke Niisaka | 2004-12-14 |
| 6798495 | Exposure apparatus, exposure method and device production method | Hiroyuki Nagasaka | 2004-09-28 |
| 6775063 | Optical system and exposure apparatus having the optical system | — | 2004-08-10 |
| 6731371 | Exposure method and apparatus, and method of fabricating a device | — | 2004-05-04 |
| 6727025 | Photomask and exposure method | — | 2004-04-27 |
| 6710854 | Projection exposure apparatus | Yuji Kudo, Saburo Kamiya | 2004-03-23 |
| 6710855 | Projection exposure apparatus and method | — | 2004-03-23 |
| 6707529 | Exposure method and apparatus | Takashi Aoki, Soichi Owa | 2004-03-16 |
| 6704092 | Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane | — | 2004-03-09 |
| 6700641 | Temperature control method and exposure apparatus thereby | — | 2004-03-02 |
| 6677601 | Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus | — | 2004-01-13 |
| 6677088 | Photomask producing method and apparatus and device manufacturing method | Nobutaka Magome | 2004-01-13 |
| 6665050 | Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis | — | 2003-12-16 |
| 6653024 | Photomask, aberration correction plate, exposure apparatus, and process of production of microdevice | Hitoshi Takeuchi, Soichi Owa | 2003-11-25 |
| 6636293 | Exposure method and apparatus having a decreased light intensity distribution | — | 2003-10-21 |
| 6627365 | Photomask and projection exposure apparatus | — | 2003-09-30 |
| 6582978 | Position detection mark and position detection method | — | 2003-06-24 |
| 6538740 | Adjusting method for position detecting apparatus | Nobutaka Magome | 2003-03-25 |
| 6421123 | Position detecting apparatus | — | 2002-07-16 |
| 6404482 | Projection exposure method and apparatus | — | 2002-06-11 |
| 6392740 | Projection exposure apparatus | Yuji Kudo | 2002-05-21 |
| 6377336 | Projection exposure apparatus | Yuji Kudo, Saburo Kamiya | 2002-04-23 |
| 6356343 | Mark for position detection and mark detecting method and apparatus | Nobutaka Magome | 2002-03-12 |
| 6342941 | Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method | Masahiro Nei, Kenichiro Kaneko, Hiroki Tateno, Jiro Inoue | 2002-01-29 |
| 6335786 | Exposure apparatus | — | 2002-01-01 |