Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11189689 | Semiconductor device including an active region that includes a switchable current path | Masayuki Furuhashi, Naoyuki KAWABATA | 2021-11-30 |
| 10497850 | Thermoelectric converter and manufacturing method for manufacturing thermoelectric converter | Akira Yamashita, Kaoru Motonami, Hidetada Tokioka | 2019-12-03 |
| 10453951 | Semiconductor device having a gate trench and an outside trench | Yutaka Fukui, Yasuhiro Kagawa, Kensuke Taguchi, Katsutoshi SUGAWARA, Rina TANAKA | 2019-10-22 |
| 9773874 | Silicon carbide semiconductor device and manufacturing method therefor | Yasuhiro Kagawa, Rina TANAKA, Yutaka Fukui | 2017-09-26 |
| 6822334 | Semiconductor device having a layered wiring structure with hard mask covering | Katsunobu Hori, Takashi Watadani, Makoto Nagano | 2004-11-23 |
| 6232209 | Semiconductor device and manufacturing method thereof | Takahiro Maruyama, Shigenori Sakamori, Akemi Teratani, Satoshi Ogino, Kazuyuki Ohmi +1 more | 2001-05-15 |
| 6156639 | Method for manufacturing contact structure | Tetsuhiro Fukao, Yoshihiro Kusumi, Hiroshi Miyatake, Shigenori Sakamori, Satoshi Iida | 2000-12-05 |
| 5695597 | Plasma reaction apparatus | — | 1997-12-09 |
| 5668041 | Method of manufacturing a semiconductor device having a capacitor | Tomonori Okudaira, Takeharu Kuroiwa, Keiichiro Kashihara | 1997-09-16 |
| 5652186 | Semiconductor device and a method of manufacturing thereof | Tomonori Okudaira, Takeharu Kuroiwa, Keiichiro Kashihara | 1997-07-29 |
| 5534458 | Method of manufacturing a semiconductor device with high dielectric capacitor having sidewall spacers | Tomonori Okudaira, Takeharu Kuroiwa, Keiichiro Kashihara | 1996-07-09 |
| 5442213 | Semiconductor device with high dielectric capacitor having sidewall spacers | Tomonori Okudaira, Takeharu Kuroiwa, Keiichiro Kashihara | 1995-08-15 |
| 5435886 | Method of plasma etching | Takahiro Maruyama, Kenji Kawai, Takahiro Hoshiko | 1995-07-25 |
| 5304775 | Method of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert element | Kyusaku Nishioka, Teruo Shibano | 1994-04-19 |
| 5292395 | ECR plasma reaction apparatus having uniform magnetic field gradient | — | 1994-03-08 |
| 4982138 | Semiconductor wafer treating device utilizing a plasma | Kenji Kawai, Moriaki Akazawa, Teruo Shibano, Tomoaki Ishida, Kyusaku Nishioka | 1991-01-01 |
| 4915979 | Semiconductor wafer treating device utilizing ECR plasma | Tomoaki Ishida, Kyusaku Nishioka, Moriaki Akazawa, Teruo Shibano, Kenji Kawai | 1990-04-10 |
| 4877509 | Semiconductor wafer treating apparatus utilizing a plasma | Toshiaki Ogawa, Kenji Kawai, Teruo Shibano, Hiroshi Morita, Kyusaku Nishioka | 1989-10-31 |
| 4873162 | X-ray mask and a manufacture method therefor | Nobuyuki Yoshioka, Yaichirou Watakabe | 1989-10-10 |
| 4873493 | Audio amplifier | — | 1989-10-10 |
| 4629998 | Variable gain equalizer with a mirror circuit having opposite phase relationship between input and output currents | — | 1986-12-16 |