Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6885726 | Fluorescent X-ray analysis apparatus | Yasushi Uehara | 2005-04-26 |
| 6420191 | Method of manufacturing semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium | Takeharu Kuroiwa, Tsuyoshi Horikawa, Tetsuro Makita, Noboru Mikami | 2002-07-16 |
| 6239460 | Semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium | Takeharu Kuroiwa, Tsuyoshi Horikawa, Tetsuro Makita, Noboru Mikami | 2001-05-29 |
| 6165556 | High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film | Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki | 2000-12-26 |
| 6101085 | High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film | Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki | 2000-08-08 |
| 6015989 | Semiconductor device having a capacitor electrode formed of iridum or ruthenium and a quantity of oxygen | Tsuyosi Horikawa, Tetsuro Makita, Takeharu Kuroiwa, Noboru Mikami | 2000-01-18 |
| 5989635 | High dielectric constant thin film structure, method for forming high dielectric constant thin film and apparatus for forming high dielectric constant thin film | Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki | 1999-11-23 |
| 5882410 | High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film | Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki | 1999-03-16 |
| 5834060 | High dielectric constant thin film structure method for forming high dielectric constant thin film and apparatus for forming high dielectric contact thin film | Takaaki Kawahara, Mikio Yamamuka, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki | 1998-11-10 |
| 5304775 | Method of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert element | Nobuo Fujiwara, Kyusaku Nishioka | 1994-04-19 |
| 4982138 | Semiconductor wafer treating device utilizing a plasma | Nobuo Fujiwara, Kenji Kawai, Moriaki Akazawa, Tomoaki Ishida, Kyusaku Nishioka | 1991-01-01 |
| 4915979 | Semiconductor wafer treating device utilizing ECR plasma | Tomoaki Ishida, Nobuo Fujiwara, Kyusaku Nishioka, Moriaki Akazawa, Kenji Kawai | 1990-04-10 |
| 4877509 | Semiconductor wafer treating apparatus utilizing a plasma | Toshiaki Ogawa, Nobuo Fujiwara, Kenji Kawai, Hiroshi Morita, Kyusaku Nishioka | 1989-10-31 |