Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5304775 | Method of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert element | Nobuo Fujiwara, Teruo Shibano | 1994-04-19 |
| 5070030 | Method of making an oxide isolated, lateral bipolar transistor | Tatsuhiko Ikeda, Kazuyuki Sugahara, Shigeru Kusunoki | 1991-12-03 |
| 4990991 | Bipolar transistor and method of manufacturing the same | Tatsuhiko Ikeda, Kazuyuki Sugahara, Shigeru Kusunoki | 1991-02-05 |
| 4982138 | Semiconductor wafer treating device utilizing a plasma | Nobuo Fujiwara, Kenji Kawai, Moriaki Akazawa, Teruo Shibano, Tomoaki Ishida | 1991-01-01 |
| 4915979 | Semiconductor wafer treating device utilizing ECR plasma | Tomoaki Ishida, Nobuo Fujiwara, Moriaki Akazawa, Teruo Shibano, Kenji Kawai | 1990-04-10 |
| 4891095 | Method and apparatus for plasma treatment | Tomoaki Ishida | 1990-01-02 |
| 4877509 | Semiconductor wafer treating apparatus utilizing a plasma | Toshiaki Ogawa, Nobuo Fujiwara, Kenji Kawai, Teruo Shibano, Hiroshi Morita | 1989-10-31 |