MY

Mikio Yamamuka

Mitsubishi Electric: 19 patents #1,108 of 25,717Top 5%
MK Mitsushita Denki Kabushiki Kaisha: 1 patents #2 of 23Top 9%
Overall (All Time): #224,288 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
8631762 Plasma CVD apparatus, method for manufacturing semiconductor film, method for manufacturing thin-film solar cell, and method for cleaning plasma CVD apparatus Tae Orita, Hiroya Yamarin 2014-01-21
8546682 Photoelectric converter and manufacturing method thereof, and photoelectric conversion module Kyozo Kanamoto, Hirofumi Konishi, Hidetada Tokioka, Hiroyuki Fuchigami 2013-10-01
6638880 Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device Takaaki Kawahara, Masayoshi Tarutani, Tsuyoshi Horikawa, Shigeru Matsuno, Takehiko Sato 2003-10-28
6512885 Liquid raw material vaporizer, semiconductor device and method of manufacturing semiconductor device Takaaki Kawahara, Masayoshi Tarutani, Tsuyoshi Horikawa 2003-01-28
6470144 Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby Masayoshi Tarutani, Tsuyoshi Horikawa, Takaaki Kawahara, Shigeru Matsuno, Takehiko Sato 2002-10-22
6448191 Method of forming high dielectric constant thin film and method of manufacturing semiconductor device Takaaki Kawahara, Tsuyoshi Horikawa, Masayoshi Tarutani, Takehiko Sato, Shigeru Matsuno 2002-09-10
6312526 Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device Takaaki Kawahara, Masayoshi Tarutani, Tsuyoshi Horikawa, Shigeru Matsuno, Takehiko Sato 2001-11-06
6273957 Vaporizing device for CVD source materials and CVD apparatus employing the same Tsuyoshi Horikawa, Takaaki Kawahara, Fusaoki Uchikawa, Shigeru Matsuno, Takehiko Sato +2 more 2001-08-14
6235649 Method of forming high dielectric constant thin film and method of manufacturing semiconductor device Takaaki Kawahara, Tsuyoshi Horikawa, Masayoshi Tarutani, Takehiko Sato, Shigeru Matsuno 2001-05-22
6179920 CVD apparatus for forming thin film having high dielectric constant Masayoshi Tarutani, Tsuyoshi Horikawa, Takaaki Kawahara 2001-01-30
6165556 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 2000-12-26
6117482 Method and apparatus for monitoring CVD liquid source for forming thin film with high dielectric constant Takaaki Kawahara, Tsuyoshi Horikawa, Masayoshi Tarutani 2000-09-12
6110283 Chemical vapor deposition apparatus Takaaki Kawahara, Masayoshi Tarutani, Tsuyoshi Horikawa 2000-08-29
6101085 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 2000-08-08
6096133 Chemical vapor deposition apparatus Akimasa Yuuki, Takaaki Kawahara, Tetsuro Makita, Koichi Ono, Tomonori Okudaira 2000-08-01
6033732 Apparatus for and method of forming thin film by chemical vapor deposition Akimasa Yuuki, Takaaki Kawahara, Tetsuro Makita, Koichi Ono, Tomonori Okudaira 2000-03-07
5989635 High dielectric constant thin film structure, method for forming high dielectric constant thin film and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 1999-11-23
5882410 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 1999-03-16
5834060 High dielectric constant thin film structure method for forming high dielectric constant thin film and apparatus for forming high dielectric contact thin film Takaaki Kawahara, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 1998-11-10
5776254 Apparatus for forming thin film by chemical vapor deposition Akimasa Yuuki, Takaaki Kawahara, Tetsuro Makita, Koichi Ono, Tomonori Okudaira 1998-07-07