TK

Takaaki Kawahara

Mitsubishi Electric: 21 patents #929 of 25,717Top 4%
RE Renesas Electronics: 5 patents #829 of 4,529Top 20%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
RT Renesas Technology: 2 patents #1,374 of 3,337Top 45%
MK Mitsushita Denki Kabushiki Kaisha: 1 patents #2 of 23Top 9%
Overall (All Time): #119,273 of 4,157,543Top 3%
31
Patents All Time

Issued Patents All Time

Showing 1–25 of 31 patents

Patent #TitleCo-InventorsDate
9455264 Semiconductor device and manufacturing method thereof Tatsunori Kaneoka 2016-09-27
9105739 Semiconductor device and manufacturing method thereof Tatsunori Kaneoka 2015-08-11
8293632 Manufacturing method of semiconductor device Masaru Kadoshima, Shinsuke Sakashita, Jiro Yugami 2012-10-23
8120118 Semiconductor device and manufacturing method of the same Shinsuke Sakashita, Jiro Yugami 2012-02-21
7855134 Semiconductor device and manufacturing method of the same Shinsuke Sakashita, Jiro Yugami 2010-12-21
7268047 Semiconductor device and method for manufacturing the same Tsunetoshi Arikado, Kazuyoshi Torii, Hiroshi Kitajima, Seiichi Miyazaki 2007-09-11
7087495 Method for manufacturing semiconductor device Kazuyoshi Torii 2006-08-08
7034369 Semiconductor device and method for manufacturing the same Tsunetoshi Arikado, Kazuyoshi Torii, Hiroshi Kitajima, Seiichi Miyazaki 2006-04-25
6984565 Method of manufacturing a semiconductor device 2006-01-10
6638880 Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device Mikio Yamamuka, Masayoshi Tarutani, Tsuyoshi Horikawa, Shigeru Matsuno, Takehiko Sato 2003-10-28
6512885 Liquid raw material vaporizer, semiconductor device and method of manufacturing semiconductor device Mikio Yamamuka, Masayoshi Tarutani, Tsuyoshi Horikawa 2003-01-28
6470144 Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby Masayoshi Tarutani, Tsuyoshi Horikawa, Mikio Yamamuka, Shigeru Matsuno, Takehiko Sato 2002-10-22
6448191 Method of forming high dielectric constant thin film and method of manufacturing semiconductor device Mikio Yamamuka, Tsuyoshi Horikawa, Masayoshi Tarutani, Takehiko Sato, Shigeru Matsuno 2002-09-10
6312526 Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device Mikio Yamamuka, Masayoshi Tarutani, Tsuyoshi Horikawa, Shigeru Matsuno, Takehiko Sato 2001-11-06
6273957 Vaporizing device for CVD source materials and CVD apparatus employing the same Mikio Yamamuka, Tsuyoshi Horikawa, Fusaoki Uchikawa, Shigeru Matsuno, Takehiko Sato +2 more 2001-08-14
6235649 Method of forming high dielectric constant thin film and method of manufacturing semiconductor device Mikio Yamamuka, Tsuyoshi Horikawa, Masayoshi Tarutani, Takehiko Sato, Shigeru Matsuno 2001-05-22
6179920 CVD apparatus for forming thin film having high dielectric constant Masayoshi Tarutani, Tsuyoshi Horikawa, Mikio Yamamuka 2001-01-30
6165556 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Mikio Yamamuka, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 2000-12-26
6117482 Method and apparatus for monitoring CVD liquid source for forming thin film with high dielectric constant Tsuyoshi Horikawa, Masayoshi Tarutani, Mikio Yamamuka 2000-09-12
6110291 Thin film forming apparatus using laser Kenyu Haruta, Koichi Ono, Hitoshi Wakata, Mutsumi Tsuda, Yoshio Saito +22 more 2000-08-29
6110283 Chemical vapor deposition apparatus Mikio Yamamuka, Masayoshi Tarutani, Tsuyoshi Horikawa 2000-08-29
6101085 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Mikio Yamamuka, Tetsuro Makita, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 2000-08-08
6096133 Chemical vapor deposition apparatus Akimasa Yuuki, Tetsuro Makita, Mikio Yamamuka, Koichi Ono, Tomonori Okudaira 2000-08-01
6033732 Apparatus for and method of forming thin film by chemical vapor deposition Akimasa Yuuki, Tetsuro Makita, Mikio Yamamuka, Koichi Ono, Tomonori Okudaira 2000-03-07
6022811 Method of uniform CVD Akimasa Yuuki, Kouitirou Tsutahara, Touru Yamaguchi 2000-02-08