TM

Tetsuro Makita

Mitsubishi Electric: 16 patents #1,485 of 25,717Top 6%
MK Mitsushita Denki Kabushiki Kaisha: 1 patents #2 of 23Top 9%
Overall (All Time): #280,098 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
6420191 Method of manufacturing semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium Takeharu Kuroiwa, Tsuyoshi Horikawa, Noboru Mikami, Teruo Shibano 2002-07-16
6239460 Semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium Takeharu Kuroiwa, Tsuyoshi Horikawa, Noboru Mikami, Teruo Shibano 2001-05-29
6187622 Semiconductor memory device and method for producing the same Takeharu Kuroiwa, Tsuyoshi Horikawa, Noboru Mikami 2001-02-13
6165556 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Mikio Yamamuka, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 2000-12-26
6101085 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Mikio Yamamuka, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 2000-08-08
6096133 Chemical vapor deposition apparatus Akimasa Yuuki, Takaaki Kawahara, Mikio Yamamuka, Koichi Ono, Tomonori Okudaira 2000-08-01
6049103 Semiconductor capacitor Tsuyoshi Horikawa, Yoshikazu Tsunemine, Takeharu Kuroiwa, Noboru Mikami 2000-04-11
6033732 Apparatus for and method of forming thin film by chemical vapor deposition Akimasa Yuuki, Takaaki Kawahara, Mikio Yamamuka, Koichi Ono, Tomonori Okudaira 2000-03-07
6015989 Semiconductor device having a capacitor electrode formed of iridum or ruthenium and a quantity of oxygen Tsuyosi Horikawa, Takeharu Kuroiwa, Noboru Mikami, Teruo Shibano 2000-01-18
5989635 High dielectric constant thin film structure, method for forming high dielectric constant thin film and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Mikio Yamamuka, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 1999-11-23
5939744 Semiconductor device with x-ray absorption layer Tsuyoshi Horikawa, Yoshikazu Tsunemine, Takeharu Kuroiwa, Noboru Mikami 1999-08-17
5882410 High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film Takaaki Kawahara, Mikio Yamamuka, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 1999-03-16
5834060 High dielectric constant thin film structure method for forming high dielectric constant thin film and apparatus for forming high dielectric contact thin film Takaaki Kawahara, Mikio Yamamuka, Tsuyoshi Horikawa, Akimasa Yuuki, Teruo Shibano 1998-11-10
5776254 Apparatus for forming thin film by chemical vapor deposition Akimasa Yuuki, Takaaki Kawahara, Mikio Yamamuka, Koichi Ono, Tomonori Okudaira 1998-07-07
5293262 Liquid crystal display device having heat-insulating members and driving circuit boards attached to rear edges of light box Kohei Adachi, Hideaki Otsuki, Kenichi Niki, Hayato Takasago 1994-03-08
5029984 Liquid crystal display device Kohei Adachi, Hideaki Otsuki, Kenichi Niki, Hayato Takasago 1991-07-09
4854230 Screen printing apparatus Kenichi Niki, Hayato Takasago 1989-08-08