MF

Masayuki Furuhashi

Mitsubishi Electric: 9 patents #3,275 of 25,717Top 15%
DE Denso: 2 patents #4,986 of 11,792Top 45%
Fujitsu Limited: 2 patents #10,930 of 24,456Top 45%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
Overall (All Time): #340,858 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
11557671 Semiconductor device having trench gate electrodes formed in first pillars including source layers formed in the first pillars being deeper into the substrate than first source layers in second pillars Masanao Ito 2023-01-17
11189689 Semiconductor device including an active region that includes a switchable current path Nobuo Fujiwara, Naoyuki KAWABATA 2021-11-30
10854762 Semiconductor device Kohei Ebihara, Takanori Tanaka 2020-12-01
10529799 Semiconductor device Kohei Ebihara 2020-01-07
10002931 Silicon carbide semiconductor device Naruhisa Miura 2018-06-19
9935170 Silicon carbide semiconductor device and method for manufacturing same Toshikazu Tanioka, Yoichiro Tarui 2018-04-03
9515145 Vertical MOSFET device with steady on-resistance Hiroaki OKABE, Tomokatsu Watanabe, Masayuki Imaizumi 2016-12-06
9076761 Silicon carbide semiconductor device and method for manufacturing silicon carbide semiconductor device Tomokatsu Watanabe, Naruhisa Miura, Shiro Hino, Toshikazu Tanioka 2015-07-07
8753951 Method for manufacturing silicon carbide semiconductor device Toshikazu Tanioka, Masayuki Imaizumi 2014-06-17
8282867 Insert molding die, insert molding apparatus and insert molding method Tsuyoshi Arai, Sayaka Okabe 2012-10-09
8035178 Solid-state imaging device Mitsuyoshi Mori, Yasuhiro Shimada, Takuma Katayama, Kenji Taniguchi 2011-10-11
7261854 Insert molding technique Tsuyoshi Arai 2007-08-28
7166516 Method for fabricating a semiconductor device including the use of a compound containing silicon and nitrogen to form an insulation film of SiN or SiCN Toshifumi Mori, Young Suk Kim, Takayuki Ohba, Ryou Nakamura 2007-01-23
6800538 Semiconductor device fabrication method and semiconductor fabrication control method Mitsuaki Hori 2004-10-05