Issued Patents All Time
Showing 26–50 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6667218 | Enhancing semiconductor structure surface area using HSG and etching | — | 2003-12-23 |
| 6664171 | Method of alloying a semiconductor device | Fernando Gonzalez, J. Brett Rolfson | 2003-12-16 |
| 6645846 | Methods of forming conductive contacts to conductive structures | John M. Drynan | 2003-11-11 |
| 6607966 | Selective method to form roughened silicon | Zhiqiang Wu, Li Li | 2003-08-19 |
| 6599840 | Material removal method for forming a structure | Zhiqiang Wu, Li Li, Kunal R. Parekh, Pai-Hung Pan, Alan R. Reinberg +1 more | 2003-07-29 |
| 6596642 | Material removal method for forming a structure | Zhiqiang Wu, Li Li, Kunal R. Parekh, Pai-Hung Pan, Alan R. Reinberg +1 more | 2003-07-22 |
| 6596648 | Material removal method for forming a structure | Zhiqiang Wu, Li Li, Kunal R. Parekh, Pai-Hung Pan, Alan R. Reinberg +1 more | 2003-07-22 |
| 6580114 | Processing methods of forming a capacitor, and capacitor construction | Thomas M. Graettinger, Paul J. Schuele, Pierre C. Fazan, Li Li, Zhiqiang Wu +1 more | 2003-06-17 |
| 6534335 | Optimized low leakage diodes, including photodiodes | Howard E. Rhodes, Werner Juengling, Steven D. Cummings | 2003-03-18 |
| 6524875 | Method for manufacturing tapered opening using an anisotropic etch during the formation of a semiconductor device | Bradley J. Howard | 2003-02-25 |
| 6507065 | Doped silicon structure with impression image on opposing roughened surfaces | Zhiquiang Wu, Li Li | 2003-01-14 |
| 6489219 | Method of alloying a semiconductor device | Fernando Gonzalez, J. Brett Rolfson | 2002-12-03 |
| 6461967 | Material removal method for forming a structure | Zhiqiang Wu, Li Li, Kunal R. Parekh, Pai-Hung Pan, Alan R. Reinberg +1 more | 2002-10-08 |
| 6429071 | Method of increasing capacitance of memory cells incorporating hemispherical grained silicon | Sujit Sharan, Anand Srinivasan, Gurtej S. Sandhu | 2002-08-06 |
| 6373084 | Shared length cell for improved capacitance | — | 2002-04-16 |
| 6355536 | Selective method to form roughened silicon | Zhigiang Wu, Li Li | 2002-03-12 |
| 6329109 | Mask having a tapered profile used during the formation of a semiconductor device | Bradley J. Howard | 2001-12-11 |
| 6326295 | Method and structure for improved alignment tolerance in multiple, singulated plugs and interconnection | — | 2001-12-04 |
| 6323557 | Method and structure for improved alignment tolerance in multiple, singulated plugs | — | 2001-11-27 |
| 6309975 | Methods of making implanted structures | Zhiqiang Wu, Li Li, Kunal R. Parekh, Pai-Hung Pan, Alan R. Reinberg +1 more | 2001-10-30 |
| 6303953 | Integrated capacitor bottom electrode with etch stop layer | Trung T. Doan | 2001-10-16 |
| 6291849 | Semiconductor structures and apparatus having separated polysilicon grains | — | 2001-09-18 |
| 6261964 | Material removal method for forming a structure | Zhiqiang Wu, Li Li, Kunal R. Parekh, Pai-Hung Pan, Alan R. Reinberg +1 more | 2001-07-17 |
| 6255687 | Doped silicon structure with impression image on opposing roughened surfaces | Zhiquiang Wu, Li Li | 2001-07-03 |
| 6238969 | Method of forming a capacitor | Pierre C. Fazan | 2001-05-29 |