Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
JR

J. Brett Rolfson — 147 Patents

Micron: 146 patents #77 of 6,345Top 2%
Boise, ID: #35 of 3,546 inventorsTop 1%
Idaho: #50 of 8,810 inventorsTop 1%
Overall (All Time): #6,501 of 4,157,543Top 1%
147 Patents All Time

Issued Patents All Time

Showing 51–75 of 147 patents

Patent #TitleCo-InventorsDate
6417559 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials John T. Moore, Scott DeBoer, Mark Fischer, Annette L. Martin, Ardavan Niroomand 2002-07-09
6395432 Methods of determining processing alignment in the forming of phase shift regions 2002-05-28
6391734 Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry Monte Manning 2002-05-21
6380100 Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substrates Rodney C. Langley 2002-04-30
6352647 Mask, and method and apparatus for making it 2002-03-05
6342435 Method for CMOS well drive in a non-inert ambient Tyler Lowrey, Fernando Gonzalez, W. Richard Barbour 2002-01-29
6340834 Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry Monte Manning 2002-01-22
6340835 Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry Monte Manning 2002-01-22
6328803 Method and apparatus for controlling rate of pressure change in a vacuum process chamber Elton J. Hochhalter 2001-12-11
6327040 Reflectance method for evaluating the surface characteristics of opaque materials Randhir P. S. Thakur, Michael Nuttall, Robert Burke 2001-12-04
6323139 Semiconductor processing methods of forming photoresist over silicon nitride materials John T. Moore, Scott DeBoer, Mark Fischer, Annette L. Martin, Ardavan Niroomand 2001-11-27
6300017 Stencil masks and methods of manufacturing stencil masks Ivan L. Berry, III 2001-10-09
6297171 Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride Annette L. Martin, Ardavan Niroomand 2001-10-02
6293789 Semiconductor processing apparatuses Rodney C. Langley 2001-09-25
6275292 Reflectance method for evaluating the surface characteristics of opaque materials Randhir P. S. Thakur, Michael Nuttall, Robert Burke 2001-08-14
6261427 System for fabricating lithographic stencil masks 2001-07-17
6255228 Method for removing contaminants from a semiconductor wafer 2001-07-03
6248671 Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substrates Rodney C. Langley 2001-06-19
6236149 Field emission devices and methods of forming field emission devices having reduced capacitance 2001-05-22
6232218 Etch stop for use in etching of silicon oxide David A. Cathey, Valerie A. Ward, Karen M. Winchester 2001-05-15
6222257 Etch stop for use in etching of silicon oxide David A. Cathey, Valerie A. Ward, Karen M. Winchester 2001-04-24
6211033 Integrated capacitor bottom electrode for use with conformal dielectric Gurtej S. Sandhu 2001-04-03
6200889 Semiconductor bonding pad 2001-03-13
6195163 Reflectance method for evaluating the surface characteristics of opaque materials Randhir P. S. Thakur, Michael Nuttall, Robert Burke 2001-02-27
6187690 Methods of manufacturing semiconductive wafers and semiconductive material stencil masks 2001-02-13