Issued Patents All Time
Showing 101–125 of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5926739 | Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride | Annette L. Martin, Ardavan Niroomand | 1999-07-20 |
| 5876878 | Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light | Christophe Pierrat | 1999-03-02 |
| 5851923 | Integrated circuit and method for forming and integrated circuit | — | 1998-12-22 |
| 5831378 | Insulative barrier useful in field emission displays for reducing surface leakage | Kevin Tjaden | 1998-11-03 |
| 5825498 | Ultraviolet light reflectance method for evaluating the surface characteristics of opaque materials | Randhir P. S. Thakur, Michael Nuttall, Robert Burke | 1998-10-20 |
| 5825074 | Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry | Monte Manning | 1998-10-20 |
| 5804336 | Method of forming opaque border on semiconductor photomask | — | 1998-09-08 |
| 5789030 | Method for depositing doped amorphous or polycrystalline silicon on a substrate | — | 1998-08-04 |
| 5786027 | Method for depositing polysilicon with discontinuous grain boundaries | — | 1998-07-28 |
| 5786116 | Atom lithographic mask having diffraction grating aligned with primary mask pattern | — | 1998-07-28 |
| 5766829 | Method of phase shift lithography | David A. Cathey | 1998-06-16 |
| 5754390 | Integrated capacitor bottom electrode for use with conformal dielectric | Gurtej S. Sandhu | 1998-05-19 |
| 5709754 | Method and apparatus for removing photoresist using UV and ozone/oxygen mixture | Keith Morinville | 1998-01-20 |
| 5707485 | Method and apparatus for facilitating removal of material from the backside of wafers via a plasma etch | William J. Crane | 1998-01-13 |
| 5696028 | Method to form an insulative barrier useful in field emission displays for reducing surface leakage | Kevin Tjaden | 1997-12-09 |
| 5672450 | Method of phase shift mask fabrication comprising a tapered edge and phase conflict resolution | — | 1997-09-30 |
| 5672539 | Method for forming an improved field isolation structure using ozone enhanced oxidation and tapering | Randhir P. S. Thakur, Fernando Gonzalez, John T. Moore | 1997-09-30 |
| 5667918 | Method of lithography using reticle pattern blinders | Steve Brainerd | 1997-09-16 |
| 5653619 | Method to form self-aligned gate structures and focus rings | Eugene H. Cloud, Trung T. Doan, Tyler Lowrey, David A. Cathey | 1997-08-05 |
| 5576126 | Phase shifting mask | — | 1996-11-19 |
| 5567644 | Method of making a resistor | Monte Manning | 1996-10-22 |
| 5495959 | Method of making substractive rim phase shifting masks | — | 1996-03-05 |
| 5487962 | Method of chromeless phase shift mask fabrication suitable for auto-cad layout | — | 1996-01-30 |
| 5468578 | Method of making masks for phase shifting lithography to avoid phase conflicts | — | 1995-11-21 |
| 5438240 | Field emission structures produced on macro-grain polysilicon substrates | David A. Cathey, Tyler Lowrey, Trung T. Doan | 1995-08-01 |