Issued Patents All Time
Showing 51–75 of 87 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8890094 | Projection lens arrangement | Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit, Stijn Willem Herman Karel Steenbrink | 2014-11-18 |
| 8890095 | Reliability in a maskless lithography system | Stijn Willem Herman Karel Steenbrink, Pieter Kruit | 2014-11-18 |
| 8884255 | Data path for lithography apparatus | Henk Derks, Teunis Van De Peut | 2014-11-11 |
| RE45206 | Lithography system, sensor and measuring method | Pieter Kruit, Erwin Slot, Tijs Frans Teepen, Stijin Willem Herman Karel Steenbrink | 2014-10-28 |
| 8859983 | Method of and system for exposing a target | — | 2014-10-14 |
| 8841636 | Modulation device and charged particle multi-beamlet lithography system using the same | Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink | 2014-09-23 |
| RE45049 | Electron beam exposure system | Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit | 2014-07-29 |
| 8759787 | Charged particle multi-beamlet lithography system with modulation device | Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink | 2014-06-24 |
| RE44908 | Electron beam exposure system | Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit | 2014-05-27 |
| 8653485 | Projection lens arrangement | Alexander Hendrik Vincent Van Veen | 2014-02-18 |
| 8618496 | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams | Stijn Willem Herman Karel Steenbrink, Alexander Hendrik Vincent Van Veen, Alrik van den Brom | 2013-12-31 |
| 8604411 | Charged particle beam modulator | Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink, Teunis Van De Peut, Henk Derks | 2013-12-10 |
| 8598544 | Method of generating a two-level pattern for lithographic processing and pattern generator using the same | Teunis Van De Peut | 2013-12-03 |
| 8586949 | Charged particle lithography system with intermediate chamber | Laura Dinu-Gürtler, Willem Henk Urbanus, Stijn Willem Herman Karel Steenbrink | 2013-11-19 |
| 8558196 | Charged particle lithography system with aperture array cooling | Alexander Hendrik Vincent Van Veen, Hendrik Jan De Jong | 2013-10-15 |
| 8502174 | Method of and system for exposing a target | — | 2013-08-06 |
| 8502176 | Imaging system | Alexander Hendrik Vincent Van Veen | 2013-08-06 |
| 8492731 | Charged particle multi-beamlet lithography system with modulation device | Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink | 2013-07-23 |
| RE44240 | Electron beam exposure system | Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit | 2013-05-28 |
| 8445869 | Projection lens arrangement | Alexander Hendrik Vincent Van Veen | 2013-05-21 |
| 8325321 | Lithography system, method of heat dissipation and frame | Pieter Kruit, Michel Pieter Dansberg | 2012-12-04 |
| 8258484 | Beamlet blanker arrangement | Alexander Hendrik Vincent Van Veen | 2012-09-04 |
| 8241036 | Implant with a ceramic coating, and method for ceramic coating of an implant | Michael Breitenstein | 2012-08-14 |
| 8242470 | Optical switching in a lithography system | Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit | 2012-08-14 |
| 8242467 | Lithography system and projection method | Remco Jager, Aukje Arianne Annette Kastelijn, Guido De Boer, Stijn Willem Herman Karel Steenbrink | 2012-08-14 |