CL

Clément Lansalot-Matras

AL American Air Liquide: 11 patents #23 of 326Top 8%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
CN CNRS: 1 patents #3,857 of 11,908Top 35%
TF Total Petrochemicals Research Feluy: 1 patents #62 of 157Top 40%
TF Total Research & Technology Feluy: 1 patents #152 of 236Top 65%
📍 Seoul, NJ: #15 of 59 inventorsTop 30%
Overall (All Time): #93,380 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 1–25 of 36 patents

Patent #TitleCo-InventorsDate
12173403 Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films Rocio Alejandra Arteaga Muller, Raphael ROCHAT, Antonio Sanchez, Jean-Marc Girard, Nicolas Blasco +3 more 2024-12-24
11549182 Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films Julien Lieffrig, Christian Dussarrat, Antoine COLAS, Jong Min Kim 2023-01-10
11162175 Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films Julien Lieffrig, Christian Dussarrat, Antoine COLAS, Jong Min Kim 2021-11-02
11021793 Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films Rocio ARTEAGA, Raphael ROCHAT, Antonio Sanchez, Jean-Marc Girard, Nicolas Blasco +3 more 2021-06-01
10731251 Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films Julien Lieffrig, Christian Dussarrat, Antoine COLAS, Jong Min Kim 2020-08-04
10648087 Etching reactants and plasma-free etching processes using the same Jooho LEE, Jean-Marc Girard, Nicolas Blasco, Satoko Gatineau 2020-05-12
10174423 Niobium-containing film forming compositions and vapor deposition of Niobium-containing films Jooho LEE, Wontae Noh 2019-01-08
10106887 Group 5 transition metal-containing compounds for vapor deposition of group 5 transition metal-containing films Wontae Noh, Jooho LEE 2018-10-23
10106568 Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films Christian Dussarrat, Jean-Marc Girard, Hana Ishii, Julien Lieffrig 2018-10-23
10094021 Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films Julien Lieffrig, Christian Dussarrat, Antoine COLAS, Jong Min Kim 2018-10-09
10023462 Niobium-Nitride film forming compositions and vapor deposition of Niobium-Nitride films Julien Lieffrig, Jooho LEE, Wontae Noh 2018-07-17
9868753 Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing films Julien Lieffrig, Hana Ishii, Christian Dussarrat 2018-01-16
9790591 Titanium-containing film forming compositions for vapor deposition of titanium-containing films Changhee Ko, Julien Gatineau, Julien Lieffrig, Hana Ishii 2017-10-17
9786671 Niobium-containing film forming compositions and vapor deposition of niobium-containing films Wontae Noh 2017-10-10
9748249 Tantalum-containing film forming compositions and vapor deposition of tantalum-containing films Wontae Noh 2017-08-29
9691770 Vanadium-containing film forming compositions and vapor deposition of vanadium-containing films Wontae Noh 2017-06-27
9691771 Vanadium-containing film forming compositions and vapor deposition of vanadium-containing films Wontae Noh 2017-06-27
9663547 Silicon- and Zirconium-containing compositions for vapor deposition of Zirconium-containing films Julien Lieffrig, Hana Ishii, Christian Dussarrat 2017-05-30
9518075 Group 5 cyclopentadienyl transition metal-containing precursors for deposition of group 5 transition metal-containing films Wontae Noh 2016-12-13
9499571 Germanium- and zirconium-containing compositions for vapor deposition of zirconium-containing films Julien Lieffrig, Hana Ishii, Christian Dussarrat 2016-11-22
9416443 Method for the deposition of a ruthenium containing film using arene diazadiene ruthenium(0) precursors Julien Gatineau 2016-08-16
9206507 Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing films depositions Julien Gatineau, Benjamin Jurcik 2015-12-08
9121093 Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereof Christian Dussarrat, Vincent M. Omarjee, Andrey V. Korolev 2015-09-01
9099301 Preparation of lanthanum-containing precursors and deposition of lanthanum-containing films 2015-08-04
9034761 Heteroleptic (allyl)(pyrroles-2-aldiminate) metal-containing precursors, their synthesis and vapor deposition thereof to deposit metal-containing films Andrey V. Korolev 2015-05-19