Issued Patents All Time
Showing 25 most recent of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12414313 | High-K capacitor dielectric having a metal oxide area comprising boron, electrical device and semiconductor apparatus including the same | Jeonggyu SONG, Younsoo Kim, Narae HAN | 2025-09-09 |
| 12408353 | Device with dielectric metal oxide layers and semiconductor apparatus including the same | Narae HAN, Jeonggyu SONG, Yongsung Kim, Eunae Cho | 2025-09-02 |
| 12398275 | Group V element-containing film compositions and vapor deposition of Group V element-containing film | Wontae Noh | 2025-08-26 |
| 12371787 | Method of forming dielectric films, new precursors and their use in the semi-conductor manufacturing | Daehyeon Kim, Wontae Noh | 2025-07-29 |
| 12356643 | Capacitor, memory device including the capacitor | Changsoo LEE, Jinhong Kim, Yongsung Kim, Jiwoon Park, Yong-Hee Cho | 2025-07-08 |
| 12349373 | Integrated circuit device | Kyooho Jung, Jeonggyu SONG, Younsoo Kim | 2025-07-01 |
| 12312677 | Step coverage using an inhibitor molecule for high aspect ratio structures | Wontae Noh | 2025-05-27 |
| 12308365 | Thin film structure including method of manufacturing | Hyungjun Kim, Changsoo LEE, Yong-Hee Cho, Yongsung Kim | 2025-05-20 |
| 12276026 | Thin film structure including dielectric material layer, method of manufacturing the same, and electronic device employing the same | Bo-eun Park, Yongsung Kim, Jeonggyu SONG | 2025-04-15 |
| 12278260 | Capacitor and semiconductor device including the same | Byunghoon Na, Kiyoung Lee, Myoungho JEONG | 2025-04-15 |
| 12191348 | Capacitors of semiconductor device capable of operating in high frequency operation environment | Jaeho Lee, Boeun PARK, Younggeun Park | 2025-01-07 |
| 12173403 | Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films | Rocio Alejandra Arteaga Muller, Raphael ROCHAT, Antonio Sanchez, Jean-Marc Girard, Nicolas Blasco +3 more | 2024-12-24 |
| 12087810 | Capacitor and electronic device including the same | Jinhong Kim, Changsoo LEE, Yongsung Kim, Euncheol Do, Yong-Hee Cho | 2024-09-10 |
| 12082395 | Semiconductor memory devices and methods of fabricating the same | Kyooho Jung, Jeong-Gyu Song, Younsoo Kim | 2024-09-03 |
| 12071690 | Thin film structure including dielectric material layer, and method of manufacturing the same, and electronic device employing the same | Narae HAN, Jeonggyu SONG, Yongsung Kim | 2024-08-27 |
| 12051717 | Anti-ferroelectric thin-film structure and electronic device including the same | Boeun PARK, Yongsung Kim, Jeonggyu SONG | 2024-07-30 |
| 12034036 | Semiconductor device and semiconductor apparatus including the same | Jeonggyu SONG, Younsoo Kim, Haeryong KIM, Boeun PARK, Eunha LEE +3 more | 2024-07-09 |
| 11980023 | Capacitor, method of controlling the same, and transistor including the same | Jaeho Lee, Boeun PARK, Yongsung Kim | 2024-05-07 |
| 11935916 | Dielectric thin-film structure and electronic device including the same | Hyangsook LEE, Junghwa KIM, Eunha LEE, Jeonggyu SONG, Myoungho JEONG | 2024-03-19 |
| 11908887 | Capacitor and semiconductor device including the same | Jaeho Lee, Boeun PARK, Younggeun Park | 2024-02-20 |
| 11898244 | Plasma-enhanced chemical vapor deposition method of forming lithium-based film by using the same | Yongsung Kim, Sanghoon Song, Wooyoung Yang, Changseung LEE, Sungjin Lim +1 more | 2024-02-13 |
| 11869926 | High-k capacitor dielectric having a metal oxide area comprising boron, electrical device, and semiconductor apparatus including the same | Jeonggyu SONG, Younsoo Kim, Narae HAN | 2024-01-09 |
| 11817475 | Semiconductor device and semiconductor apparatus including the same | Jaeho Lee, Yong-Hee Cho, Seungwoo Jang, Younggeun Park | 2023-11-14 |
| 11810946 | Integrated circuit device including capacitor with metal nitrate interfacial layer | Jeonggyu SONG, Kyooho Jung, Younsoo Kim, Haeryong KIM | 2023-11-07 |
| 11798980 | Integrated circuit device and electronic device including capacitor with interfacial layer containing metal element, other element, nitrogen, and oxygen | Jeonggyu SONG, Kyooho Jung, Younsoo Kim, Haeryong KIM | 2023-10-24 |