YS

Yuusuke Sato

KT Kabushiki Kaisha Toshiba: 28 patents #933 of 21,451Top 5%
NT Nuflare Technology: 19 patents #17 of 298Top 6%
TK Toshiba Kikai: 3 patents #155 of 713Top 25%
LL L'Air Liquide: 1 patents #17 of 128Top 15%
KC Koki Holdings Co.: 1 patents #124 of 215Top 60%
PS Penn State: 1 patents #667 of 1,788Top 40%
TC Toshiba Ceramics Co.: 1 patents #190 of 458Top 45%
Overall (All Time): #54,506 of 4,157,543Top 2%
50
Patents All Time

Issued Patents All Time

Showing 26–50 of 50 patents

Patent #TitleCo-InventorsDate
7942974 Method of cleaning a film-forming apparatus Naoki Tamaoki, Jun Sonobe, Takamitsu Shigemoto, Takako Kimura 2011-05-17
7927760 Methods to control water flow and distribution in direct methanol fuel cells Chao Wang, Guoqiang Lu, Wenpeng Liu, Fuqiang Liu, Eiichi Sakaue +1 more 2011-04-19
7709130 Fuel cell Koichiro Kawano, Ryosuke Yagi, Masato Akita 2010-05-04
7681760 Liquid cartridge Atsushi Sadamoto, Eiichi Sakaue, Masato Akita 2010-03-23
7678481 Fuel cell system with a fuel tank configured to store a fuel at a pressure higher than atmospheric pressure Nobutaka Kikuiri 2010-03-16
7615295 Hydrogen generator and fuel cell system Yoshiyuki Isozaki, Hiroshi Takeda 2009-11-10
7597990 Fuel cell and fuel cell system 2009-10-06
7597982 Fuel cell system with a gas supply pump that applies negative pressure to the anode and cathode Eiichi Sakaue, Nobutaka Kikuiri, Atsushi Sadamoto 2009-10-06
7563524 Fuel cell system Kei Matsuoka, Masato Akita, Hiroaki Hirazawa 2009-07-21
7479338 Fuel cell system Eiichi Sakaue, Kei Matsuoka, Kentaro Tomioka 2009-01-20
7364811 Fuel Cell Kentaro Tomioka, Kei Matsuoka, Hiroaki Hirazawa, Eiichi Sakaue 2008-04-29
7351489 Fuel cell unit Kaname Miyazaki, Eiichi Sakaue, Kei Matsuoka, Atsushi Sadamoto 2008-04-01
7264897 Fuel cell system Nobutaka Kikuiri 2007-09-04
7192626 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition Christian Dussarrat, Jean-Marc Girard, Takako Kimura, Naoki Tamaoki 2007-03-20
6365231 Ammonium halide eliminator, chemical vapor deposition system and chemical vapor deposition process Takashi Kataoka, Naoki Tamaoki, Toshimitsu Ohmine 2002-04-02
6113705 High-speed rotational vapor deposition apparatus and high-speed rotational vapor deposition thin film method Tadashi Ohashi, Katuhiro Chaki, Ping Xin, Tatsuo Fujii, Katsuyuki Iwata +2 more 2000-09-05
6074696 Substrate processing method which utilizes a rotary member coupled to a substrate holder which holds a target substrate 2000-06-13
6022806 Method of forming a film in recess by vapor phase growth Naoki Tamaoki, Toshimitu Ohmine 2000-02-08
5926402 Simulation method with respect to trace object that event occurs in proportion to probability and computer program product for causing computer system to perform the simulation Shinichi Tatsuta, Naoki Tamaoki, Hiroshi Komiyama, Yasuyuki Egashira 1999-07-20
5897710 Substrate processing apparatus and substrate processing method Toshimitsu Ohmine, Takaaki Honda 1999-04-27
5766360 Substrate processing apparatus and substrate processing method Toshimitsu Ohmine, Takaaki Honda 1998-06-16
5527393 Vapor-phase deposition apparatus and vapor-phase deposition method Toshimitsu Ohmine 1996-06-18
5474612 Vapor-phase deposition apparatus and vapor-phase deposition method Toshimitsu Ohmine 1995-12-12
5344492 Vapor growth apparatus for semiconductor devices Mitsuo Sato, Kiyoshi Yoshikawa 1994-09-06
5205870 Vapor deposition apparatus Akio Ui, Keiichi Akagawa, Toshimitsu Ohmine 1993-04-27