Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE49602 | Lithography system, sensor and measuring method | Pieter Kruit, Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland | 2023-08-08 |
| RE48046 | Lithography system, sensor and measuring method | Pieter Kruit, Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland | 2020-06-09 |
| RE46452 | Electrostatic lens structure | Johan Joost Koning, Peter Veltman | 2017-06-27 |
| 9362084 | Electro-optical element for multiple beam alignment | Alrik van den Brom, Marco Jan-Jaco Wieland, Guido De Boer, Pieter Kappelhof | 2016-06-07 |
| 9105439 | Projection lens arrangement | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit | 2015-08-11 |
| RE45552 | Lithography system and projection method | Pieter Kruit, Remco Jager, Marco Jan-Jaco Wieland | 2015-06-09 |
| 8987679 | Enhanced integrity projection lens assembly | Johan Joost Koning, Bart Schipper | 2015-03-24 |
| 8921758 | Modulation device and charged particle multi-beamlet lithography system using the same | Marco Jan-Jaco Wieland, Teunis Van De Peut, Alexander Hendrik Vincent Van Veen, Remco Jager, Ralph Van Melle +1 more | 2014-12-30 |
| 8916837 | Charged particle lithography system with intermediate chamber | Laura Dinu-Gürtler, Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2014-12-23 |
| 8890094 | Projection lens arrangement | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit | 2014-11-18 |
| 8890095 | Reliability in a maskless lithography system | Pieter Kruit, Marco Jan-Jaco Wieland | 2014-11-18 |
| 8841636 | Modulation device and charged particle multi-beamlet lithography system using the same | Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen | 2014-09-23 |
| 8841920 | Capacitive sensing system | Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Niels Vergeer | 2014-09-23 |
| 8759787 | Charged particle multi-beamlet lithography system with modulation device | Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen | 2014-06-24 |
| 8716671 | Enhanced integrity projection lens assembly | Johan Joost Koning, Bart Schipper | 2014-05-06 |
| 8648318 | Multiple beam charged particle optical system | Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen | 2014-02-11 |
| 8624478 | High voltage shielding arrangement of a charged particle lithography system | Johan Joost Koning, Norman Hendrikus Rudolf Baars, Bart Schipper | 2014-01-07 |
| 8618496 | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams | Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Alrik van den Brom | 2013-12-31 |
| 8604411 | Charged particle beam modulator | Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Teunis Van De Peut, Henk Derks | 2013-12-10 |
| 8598545 | Multiple beam charged particle optical system | Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen | 2013-12-03 |
| 8586949 | Charged particle lithography system with intermediate chamber | Laura Dinu-Gürtler, Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2013-11-19 |
| 8570055 | Capacitive sensing system | Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Niels Vergeer | 2013-10-29 |
| 8513959 | Integrated sensor system | Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Niels Vergeer | 2013-08-20 |
| 8492731 | Charged particle multi-beamlet lithography system with modulation device | Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen | 2013-07-23 |
| 8362441 | Enhanced integrity projection lens assembly | Johan Joost Koning, Bart Schipper | 2013-01-29 |