Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11061373 | Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process | Gurdaman Khaira, Germain Louis Fenger, Azat Latypov, John L. Sturtevant | 2021-07-13 |
| 10248028 | Source optimization for image fidelity and throughput | — | 2019-04-02 |
| 9678435 | Horizontal development bias in negative tone development of photoresist | Yunfei Deng, Dmitry Medvedev, Yuan He, Konstantinos Adam | 2017-06-13 |
| 9418195 | Layout content analysis for source mask optimization acceleration | Juan Andres Torres Robles, Oberdan Otto | 2016-08-16 |
| 9355201 | Density-based integrated circuit design adjustment | — | 2016-05-31 |
| 9330228 | Generating guiding patterns for directed self-assembly | Juan Andres Torres Robles, Joydeep Mitra, Yuansheng Ma, Krasnova Polina Andreevna | 2016-05-03 |
| 9323161 | Source optimization by assigning pixel intensities for diffractive optical element using mathematical relationship | — | 2016-04-26 |
| 9032357 | Generating guiding patterns for directed self-assembly | Juan Andres Torres Robles, Kyohei Sakajiri | 2015-05-12 |
| 8843859 | Layout content analysis for source mask optimization acceleration | Juan Andres Torres Robles, Oberdan Otto | 2014-09-23 |
| 8799832 | Optical proximity correction for topographically non-uniform substrates | Uwe Hollerbach, Konstantinos Adam | 2014-08-05 |
| 8788982 | Layout design defect repair using inverse lithography | George P. Lippincott, Sergey Kobelkov | 2014-07-22 |
| 8607168 | Contour alignment for model calibration | Ir Kusnadi, Thuy Q Do, John L. Sturtevant | 2013-12-10 |
| 8464185 | Electron beam simulation corner correction for optical lithography | — | 2013-06-11 |
| 8434031 | Inverse mask design and correction for electronic design | — | 2013-04-30 |
| 8108806 | Contrast-based resolution enhancement for photolithographic processing | Juan Andres Torres Robles | 2012-01-31 |
| 8037429 | Model-based SRAF insertion | Shumay D. Shang, Lisa Swallow | 2011-10-11 |
| 7987434 | Calculation system for inverse masks | Kyohei Sakajiri | 2011-07-26 |
| 7805699 | Shape-based photolithographic model calibration | Ir Kusnadi | 2010-09-28 |
| 7623220 | Source optimization for image fidelity and throughput | — | 2009-11-24 |
| 7562336 | Contrast based resolution enhancement for photolithographic processing | Juan Andres Torres Robles | 2009-07-14 |
| 7552416 | Calculation system for inverse masks | Kyohei Sakajiri | 2009-06-23 |
| 7487489 | Calculation system for inverse masks | — | 2009-02-03 |
| 7392168 | Method of compensating for etch effects in photolithographic processing | Franklin Mark Schellenberg | 2008-06-24 |
| 7378202 | Grid-based resist simulation | Dmitry Medvedev | 2008-05-27 |
| 7293249 | Contrast based resolution enhancement for photolithographic processing | Juan Andres Torres Robles | 2007-11-06 |