| 12378439 |
Compositions for tungsten etching inhibition |
Michael Lauter, Haci Osman GUEVENC, Wei-Lan Chiu |
2025-08-05 |
| 12351737 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Haci Osman GUEVENC, Michael Lauter, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more |
2025-07-08 |
| 11993729 |
Chemical mechanical polishing composition |
Christian Daeschlein, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more |
2024-05-28 |
| 11725117 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Haci Osman GUEVENC, Michael Lauter, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more |
2023-08-15 |
| 10899945 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more |
2021-01-26 |
| 10844325 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Julian Proelss +4 more |
2020-11-24 |
| 10844333 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Piotr Przybylski, Julian Proelss +4 more |
2020-11-24 |
