RR

Ron Rulkens

NS Novellus Systems: 12 patents #69 of 780Top 9%
Lam Research: 4 patents #662 of 2,128Top 35%
AL Apollo Precision Fujian Limited: 2 patents #2 of 34Top 6%
BC Beijing Apollo Ding Rong Solar Technology Co.: 2 patents #11 of 51Top 25%
Air Products And Chemicals: 1 patents #1,147 of 1,997Top 60%
Overall (All Time): #208,344 of 4,157,543Top 6%
21
Patents All Time

Issued Patents All Time

Showing 1–21 of 21 patents

Patent #TitleCo-InventorsDate
10211351 Photovoltaic cell with high efficiency CIGS absorber layer with low minority carrier lifetime and method of making thereof John Corson, Alex Austin, Robert Tas, Neil Mackie, Mats Larsson +9 more 2019-02-19
10043921 Photovoltaic cell with high efficiency cigs absorber layer with low minority carrier lifetime and method of making thereof John Corson, Alex Austin, Robert Tas, Neil Mackie, Mats Larsson +9 more 2018-08-07
9255323 Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube Robert Martinson, Heinrich Von Bunau, Mark Campello, Tom Heckel, Johannes Vlcek 2016-02-09
9169548 Photovoltaic cell with copper poor CIGS absorber layer and method of making thereof John Corson, Alex Austin, Jochen Titus, Robert Tas, Paul Shufflebotham +2 more 2015-10-27
9128493 Method and apparatus for plating solution analysis and control Nanhai Li, Artur Kolics, Aman Jain, Darin Birtwhistle, Chee Leong Raymond CHAN 2015-09-08
8622017 Electroless plating system Igor Ivanov, Robert Tas, Shashank Ravindra Kulkarni 2014-01-07
7972652 Electroless plating system Igor Ivanov, Robert Tas, Shashank Ravindra Kulkarni 2011-07-05
7913644 Electroless deposition system Robert Tas, Shashank Ravindra Kulkarni, Artur Kolics, Nancy E. Gilbert 2011-03-29
7790633 Sequential deposition/anneal film densification method Raihan M. Tarafdar, George D. Papasouliotis, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton +1 more 2010-09-07
7491653 Metal-free catalysts for pulsed deposition layer process for conformal silica laminates George D. Papasouliotis, Seon-Mee Cho, Mihai Buretea, Dennis M. Hausmann, Michael Barnes 2009-02-17
7297608 Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition George D. Papasouliotis, Raihan M. Tarafdar, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton +1 more 2007-11-20
7294583 Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films George D. Papasouliotis, Dennis M. Hausmann, Raihan M. Tarafdar, Bunsen B. Nie, Adrianne K. Tipton +1 more 2007-11-13
7271112 Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry George D. Papasouliotis, Raihan M. Tarafdar, Adrianne K. Tipton, Dennis M. Hausmann, Jeff Tobin 2007-09-18
7223707 Dynamic rapid vapor deposition process for conformal silica laminates George D. Papasouliotis, Jeff Tobin, Dennis M. Hausmann, Adrianne K. Tipton, Raihan M. Tarafdar +1 more 2007-05-29
7202185 Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer Dennis M. Hausmann, Jeff Tobin, George D. Papasouliotis, Raihan M. Tarafdar, Adrianne K. Tipton +1 more 2007-04-10
7148155 Sequential deposition/anneal film densification method Raihan M. Tarafdar, George D. Papasouliotis, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton +1 more 2006-12-12
7129189 Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) Dennis M. Hausmann, Adrianne K. Tipton, Bunsen B. Nie, George D. Papasouliotis, Raihan M. Tarafdar 2006-10-31
7097878 Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films Dennis M. Hausmann, Raihan M. Tarafdar, George D. Papasouliotis, Bunsen B. Nie, Adrianne K. Tipton +1 more 2006-08-29
7064227 Precursors for silica or metal silicate films Xinjian Lei 2006-06-20
6919279 Endpoint detection for high density plasma (HDP) processes Didier P. Florin 2005-07-19
6762849 Method for in-situ film thickness measurement and its use for in-situ control of deposited film thickness 2004-07-13