RR

Robert Robertson

Applied Materials: 13 patents #1,030 of 7,310Top 15%
AT Applied Komatsu Technology: 9 patents #5 of 62Top 9%
AL Alliedsignal: 1 patents #1,187 of 2,631Top 50%
AP Applied Technology Limited Partnership: 1 patents #12 of 28Top 45%
Overall (All Time): #153,926 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
11026663 Ultrasound imaging apparatus and methods John Fothergill 2021-06-08
7438228 Systems and methods for managing electronic prescriptions Scott Paul Robertson, Harikrishna Madanaraj, Marappan Ramachandran 2008-10-21
6902682 Method and apparatus for electrostatically maintaining substrate flatness Quanyuan Shang, Kam S. Law, James T. Gardner 2005-06-07
6610374 Method of annealing large area glass substrates Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, William Harshbarger 2003-08-26
6500265 Apparatus for electrostatically maintaining subtrate flatness Quanyuan Shang, Kam S. Law, James T. Gardner 2002-12-31
6468601 Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology Quanyuan Shang, Kam S. Law, Dan Maydan 2002-10-22
6444277 Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates Kam S. Law, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan 2002-09-03
6355108 Film deposition using a finger type shadow frame Tae Kyung Won, Quanyuan Shang, Soo Young Choi, Kam S. Law, Robert I. Greene +1 more 2002-03-12
6352910 Method of depositing amorphous silicon based films having controlled conductivity William Harshbarger, Takako Takehara, Jeff Olsen, Regina Qiu, Yvonne LeGrice +2 more 2002-03-05
6338874 Method for multilayer CVD processing in a single chamber Kam S. Law, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan 2002-01-15
6294219 Method of annealing large area glass substrates Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, William Harshbarger 2001-09-25
6177023 Method and apparatus for electrostatically maintaining substrate flatness Quanyuan Shang, Kam S. Law, James T. Gardner 2001-01-23
6172322 Annealing an amorphous film using microwave energy Quanyuan Shang, Kam S. Law, Takako Takehara, Taekyung Won, Sheng Sun 2001-01-09
6055927 Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology Quanyuan Shang, Kam S. Law, Dan Maydan 2000-05-02
6024044 Dual frequency excitation of plasma for film deposition Kam S. Law, Quanyuan Shang, Jeff Olsen, Carl A. Sorensen 2000-02-15
5902650 Method of depositing amorphous silicon based films having controlled conductivity Jeff Feng, Kam S. Law 1999-05-11
5861197 Deposition of high quality conformal silicon oxide thin films on glass substrates Kam S. Law, Guofu J. Feng 1999-01-19
5851602 Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors Kam S. Law, Jeffrey Feng 1998-12-22
5589233 Single chamber CVD process for thin film transistors Kam S. Law, Guofu J. Feng 1996-12-31
5567476 Multi-step chemical vapor deposition method for thin film transistors Kam S. Law, Michael Kollrack, Angela Lee, Takako Takehara, Guofu J. Feng +1 more 1996-10-22
5441768 Multi-step chemical vapor deposition method for thin film transistors Kam S. Law, Michael Kollrack, Angela Lee, Takako Takehara, Guofu J. Feng +1 more 1995-08-15
5399387 Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates Kam S. Law, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan 1995-03-21
5380566 Method of limiting sticking of body to susceptor in a deposition treatment Marc M. Kollrack, Angela Lee, Kam S. Law, Dan Maydan 1995-01-10
5366585 Method and apparatus for protection of conductive surfaces in a plasma processing reactor Kam S. Law, John M. White 1994-11-22
5359445 Fiber optic sensor 1994-10-25