Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12249515 | Etching method and etching apparatus | Shigeru Tahara, Jacques Faguet, Kaoru Maekawa, Kumiko Ono, Nagisa Sato +3 more | 2025-03-11 |
| 12131914 | Selective etching with fluorine, oxygen and noble gas containing plasmas | Du Zhang, Hojin Kim, Shigeru Tahara, Kaoru Maekawa, Mingmei Wang +4 more | 2024-10-29 |
| 11120999 | Plasma etching method | Koichi Yatsuda, Kaoru Maekawa, Nagisa Sato, Kumiko Ono, Shigeru Tahara +4 more | 2021-09-14 |
| 8012365 | Deep anisotropic silicon etch method | Remi Dussart, Xavier Mellhaoui, Lawrence J. Overzet, Pierre Ranson, Thomas Tillocher +1 more | 2011-09-06 |