Issued Patents All Time
Showing 25 most recent of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11461532 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Jun Ye | 2022-10-04 |
| 11042687 | Fast freeform source and mask co-optimization method | Jun Ye, Yu Cao | 2021-06-22 |
| 10839131 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Jun Ye | 2020-11-17 |
| 10592633 | Fast freeform source and mask co-optimization method | Jun Ye, Yu Cao | 2020-03-17 |
| 10424396 | Computation pipeline of location-dependent variant calls | Jun Ye, Wei Zhou, Hanying Feng, Hong Chen, Xiaofeng Liu | 2019-09-24 |
| 10423745 | Correction for flare effects in lithography system | Hua-Yu Liu, Jiangwei Li, Wei-Cheng Liu, Jiong Jiang | 2019-09-24 |
| 10424395 | Computation pipeline of single-pass multiple variant calls | Jun Ye, Wei Zhou, Hanying Feng, Hong Chen, Xiaofeng Liu | 2019-09-24 |
| 10401732 | Optimization flows of source, mask and projection optics | Duan-Fu Stephen Hsu, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2019-09-03 |
| 10198549 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Jun Ye | 2019-02-05 |
| 9953127 | Fast freeform source and mask co-optimization method | Jun Ye, Yu Cao | 2018-04-24 |
| 9588438 | Optimization flows of source, mask and projection optics | Duan-Fu Stephen Hsu, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2017-03-07 |
| 9372957 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Jun Ye | 2016-06-21 |
| 9262579 | Integration of lithography apparatus and mask optimization process with multiple patterning process | Jun Ye, Hong Chen | 2016-02-16 |
| 9111062 | Fast freeform source and mask co-optimization method | Jun Ye, Yu Cao | 2015-08-18 |
| 9110382 | Source polarization optimization | — | 2015-08-18 |
| 8942463 | Harmonic resist model for use in a lithographic apparatus and a device manufacturing method | Yu Cao, Antoine Jean Bruguier, Wenjin Shao | 2015-01-27 |
| 8938694 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Jun Ye | 2015-01-20 |
| 8893067 | System and method for lithography simulation | Jun Ye, Yen-Wen Lu, Yu Cao, Xun Chen | 2014-11-18 |
| 8887104 | Correction for flare effects in lithography system | Hua-Yu Liu, Jiangwei Li, Wei-Cheng Liu, Jiong Jiang | 2014-11-11 |
| 8819601 | Integration of lithography apparatus and mask optimization process with multiple patterning process | Jun Ye, Hong Chen | 2014-08-26 |
| 8739082 | Method of pattern selection for source and mask optimization | Hua-Yu Liu, Hong Chen, Zhi-Pan Li, Jun Ye, Min-Chun Tsai +3 more | 2014-05-27 |
| 8682059 | Harmonic resist model for use in a lithographic apparatus and a device manufacturing method | Yu Cao, Antoine Jean Bruguier, Wenjin Shao | 2014-03-25 |
| 8589829 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Jun Ye | 2013-11-19 |
| 8584056 | Fast freeform source and mask co-optimization method | Jun Ye, Yu Cao | 2013-11-12 |
| 8543947 | Selection of optimum patterns in a design layout based on diffraction signature analysis | Hua-Yu Liu, Hong Chen, Zhi-Pan Li | 2013-09-24 |